Kiʻi ʻoniʻoni kūʻokoʻa AR i uhi ʻia i ka lens silika monocrystalline

Kiʻi ʻoniʻoni kūʻokoʻa AR anti-reflection kiʻi ʻoniʻoni i uhi ʻia

ʻO ka wehewehe pōkole:

ʻO ka lens silicon monocrystalline i hoʻopili ʻia he mea hana optical e pili ana i ka kiʻekiʻe monocrystalline silicon (Si) ma o ka hoʻoponopono ʻana i ka optical a me ka ʻenehana uhi. He maikaʻi loa ka hoʻouna ʻana o ka māmā monocrystalline i loko o ka band infrared (1.2-7μm), a hui pū ʻia me nā uhi e like me ke kiʻi anti-reflection film (AR), kiʻi kiʻi kiʻi kiʻekiʻe (HR) a i ʻole kiʻi kānana, hiki ke hoʻomaikaʻi nui i ka transmittance a i ʻole ka hana noʻonoʻo ʻana o nā hui kikoʻī. Hoʻohana nui ʻia nā huahana i ka infrared imaging, laser optics a me ka ʻike semiconductor.

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

ʻO nā hiʻohiʻona lens silika i uhi ʻia:

1. Hoʻokō Optical:
ʻO ka laulā hoʻouna: 1.2-7μm (kokoke i ka infrared a i ka mid-infrared), ka transmittance> 90% i ka 3-5μm atmospheric window band (ma hope o ka uhi ʻana).
Ma muli o ka index refractive kiʻekiʻe (n≈ 3.4@4μm), pono e uhi ʻia kahi kiʻi anti-reflection (e like me MgF₂/Y₂O₃) e hōʻemi i ka nalowale o ka noʻonoʻo ʻana.

2. Paʻa wela:
ʻO ke koena hoʻonui wela haʻahaʻa (2.6×10⁻⁶/K), ke kūpaʻa wela kiʻekiʻe (ka mahana hana a hiki i 500 ℃), kūpono no nā noi laser mana kiʻekiʻe.

3. Nā waiwai mīkini:
ʻO ka paʻakikī 7 o Mohs, ka pale ʻana, akā ʻoi aku ka brittleness kiʻekiʻe, pono i ka pale chamfering lihi.

4. Nā hiʻohiʻona uhi:
Customized anti-reflection film (AR@3-5μm), high reflection film (HR@10.6μm for CO₂ laser), bandpass filter film, etc.

Hoʻohana ʻia nā lens lens i uhi ʻia:

(1) ʻōnaehana kiʻi wela infrared
Ma ke ʻano he mea nui o nā lens infrared (3-5μm a i ʻole 8-12μm band) no ka nānā ʻana i ka palekana, ka nānā ʻana i nā ʻoihana a me nā mea ʻike maka pō koa.

(2) Pūnaehana optical laser
CO₂ Laser (10.6μm): ʻO nā leki hōʻike kiʻekiʻe no nā resonator laser a i ʻole ka hoʻokele kukuna.

Laser fiber (1.5-2μm): Hoʻomaikaʻi ke kiʻi ʻoniʻoni anti-reflection i ka maikaʻi o ka hui ʻana.

(3) Nā lako hoʻokolohua Semiconductor
ʻO ka pahuhopu microscopic infrared no ka ʻike ʻana i ka defect wafer, kū i ka corrosion plasma (pono ka pale uhi kūikawā).

(4) nā mea hana spectral analysis
Ma ke ʻano he ʻāpana spectral o Fourier infrared spectrometer (FTIR), pono ka transmittance kiʻekiʻe a me ka distortion haʻahaʻa haʻahaʻa.

Nā ʻāpana ʻenehana:

Ua lilo ka lens silicon monocrystalline i hoʻololi ʻole ʻia i loko o ka ʻōnaehana optical infrared ma muli o kāna hoʻouna kukui infrared maikaʻi loa, ke kūpaʻa wela kiʻekiʻe a me nā hiʻohiʻona hoʻonaninani. ʻO kā mākou mau lawelawe kūikawā kūikawā e hōʻoia i ka hana maikaʻi loa o nā lens i ka laser, ka nānā a me nā noi kiʻi.

Kūlana	Kiekie Pricision
Mea waiwai	Silika
Nui	5mm-300mm	5mm-300mm
Ka hoʻomanawanui ʻana	±0.1mm	±0.02mm
Mākaʻikaʻi Aperture	≥90%	95%
ʻAno ʻili	60/40	20/10
Ke kikowaena	3'	1'
ʻO ka hoʻomanawanui lōʻihi	±2%	±0.5%
Ka uhi ʻana	ʻAʻole i uhi ʻia, AR, BBAR, Hōʻike

XKH lawelawe maʻamau

Hāʻawi ʻo XKH i ke kaʻina hana piha o nā lens silicon monocrystalline i uhi ʻia: Mai ka monocrystalline silicon substrate koho (resistivity> 1000Ω·cm), precision optical processing (spherical/aspherical, surface accuracy λ/4@633nm), ka uhi maʻamau (anti-reflection/kiʻekiʻe noʻonoʻo / kānana kiʻiʻoniʻoni e kākoʻo i ka hoʻolālā ʻana i ka hoʻolālā ʻana o ka honua, hoʻopaʻa i ka hoʻolālā ʻana i ka ʻenehana, hoʻopaʻa ʻia i ka hoʻolālā ʻana i ka honua, hoʻopaʻa i ka hōʻino ʻana i ka ʻili uila, hoʻopaʻa i ka hoʻolālā ʻana. ka hoʻāʻo ʻana), kākoʻo i nā ʻāpana liʻiliʻi (10 mau ʻāpana) i ka hana nui. Hāʻawi pū ia i nā palapala ʻenehana (nā pale uhi, nā ʻāpana optical) a me ke kākoʻo ma hope o ke kūʻai aku e hoʻokō i nā koi koi o nā ʻōnaehana optical infrared.