ʻO ka mea hana kiʻekiʻe Alumina Ceramic End Effector (Fork Arm) no ka Semiconductor a me ka lumi hoʻomaʻemaʻe.

Kiʻekiʻe-Performance Alumina Ceramic End Effector (Fork Arm) no Semiconductor a me Cleanroom Automation Kiʻi Hōʻike ʻia.

ʻO ka wehewehe pōkole:

ʻO ka Alumina Ceramic End Effector, i kapa ʻia ʻo ia he ceramic fork arm a i ʻole robotic ceramic lima, he mea hoʻohana kiʻekiʻe kiʻekiʻe i hoʻolālā ʻia no nā ʻōnaehana automated i semiconductor, photovoltaic, panel display, a me nā ʻenehana hoʻomaʻemaʻe kiʻekiʻe. Hoʻolālā ʻia ia e hāʻawi i ke kūpaʻa wela ʻokoʻa, ka rigidity mechanical, a me ke kūpaʻa kemika, hāʻawi i ka lawe maʻemaʻe, hilinaʻi, a palekana hoʻi o nā mea koʻikoʻi e like me nā wafers silika, nā substrate aniani, a me nā ʻāpana uila uila.

E hoʻouna i ka leka uila iā mākou

Nā hiʻohiʻona

Kiʻi kikoʻī

Hoʻolauna Huahana

E like me ke ʻano o ka robotic hopena hopena, ʻo kēia ʻāpana seramika ka mea hope loa ma waena o ka ʻōnaehana automation a me ka mea hana. He koʻikoʻi koʻikoʻi ia i ka hoʻololi pololei ʻana, ka hoʻonohonoho ʻana, ka hoʻouka ʻana a me ka hoʻonohonoho ʻana i nā hana i loko o nā lumi maʻemaʻe a me nā kaiapuni.

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Nānā Mea Manaʻo – Alumina Ceramic (Al₂O₃)

ʻO ka alumina ceramic kahi mea paʻa paʻa a me ke kemika inert ʻenehana seramika i ʻike ʻia no kāna mau mea mīkini a me nā waiwai uila. ʻO ka alumina maʻemaʻe kiʻekiʻe (≥ 99.5%) i hoʻohana ʻia i kēia mau hopena hopena e hōʻoia:

Paʻa kiʻekiʻe (Mohs 9): ʻO ka lua wale nō i ke daimana, hāʻawi ka alumina i ke kūpaʻa ʻoi loa.
Hiki ke wela kiʻekiʻe: Mālama i ka pono o ka hale ma luna o 1600°C.
ʻO ka inertness kemika: Kūleʻa i nā ʻakika, alkalis, solvents, a me nā kaiapuni etching plasma.
Hoʻopili uila: Me ka ikaika dielectric kiʻekiʻe a me ka poho dielectric haʻahaʻa.
Hoʻonui wela haʻahaʻa: E hōʻoia i ka paʻa ʻana o ka dimensional i nā kaiapuni paikikala wela.
Haʻahaʻa haʻahaʻa haʻahaʻa: Pono no ka hoʻokō ʻana o ka lumi maʻemaʻe (Papa 10 a i ka Papa 1000).

ʻO kēia mau hiʻohiʻona e hana i ka alumina ceramic i kūpono no nā hana koʻikoʻi i loko o nā ʻoihana koʻikoʻi.

Nā noi hana

Hoʻohana nui ʻia ka alumina ceramic end effector i nā kaʻina hana ʻenehana kiʻekiʻe, ʻoiai kahi e hāʻule pōkole ai nā mea metala a i ʻole nā mea palaka ma muli o ka hoʻonui ʻana o ka wela, ka hoʻohaumia, a me nā pilikia corrosion. Loaʻa nā kahua noi nui:

Hoʻoili wafer semiconductor
ʻO ka hoʻouka ʻana a me ka wehe ʻana o nā ʻōnaehana Photolithography
Hoʻohana ʻia ka substrate aniani ma nā laina OLED a me LCD
ʻO ka hoʻoili ʻana o ka wafer silikona crystalline i ka hana ʻana o nā cell solar
ʻO ka nānā ʻana i ka optical a i ʻole microelectronic
Ka lawe laʻana i loko o nā labs analytical a biomedical
Pūnaehana hoʻoheheʻe kaiapuni

ʻO kona hiki ke hana me ka ʻole o ka hoʻokomo ʻana i nā ʻāpana a i ʻole ka uku static he mea nui ia no nā hana robotic pololei i ka automation lumi maʻemaʻe.

Nā hiʻohiʻona hoʻolālā & hoʻopilikino

Hoʻonohonoho ʻia kēlā me kēia hopena hopena ceramic e kūpono i kahi lima robotic kikoʻī a i ʻole ʻōnaehana lawelawe wafer. Kākoʻo mākou i ka hoʻoponopono piha ma muli o:

Hoʻohālikelike ka nui o ka wafer: 2", 4", 6", 8", 12" a oi
Geometry a me ka hakahaka: Hoʻokomo i ka paʻa lihi, kākoʻo ʻaoʻao hope, a i ʻole nā hoʻolālā wafer notched
Nā awa ʻūhā: ʻO nā puka ʻūhā i hoʻohui ʻia a i ʻole nā kahawai no ka hoʻopili ʻole ʻana
Hoʻonohonoho kau ʻana: Nā puka, nā kaula, nā ʻīpuka i hoʻohālikelike ʻia i ka flange mea hana hope o kāu robot
Lapaʻau ʻili: Hoʻopiʻi ʻia, hoʻopaʻa ʻia, a i ʻole ka hoʻopau ʻāina maikaʻi (Ra <0.2 µm loaʻa)
Palekana lihi: Nā kihi poepoe a i ʻole chamfering e pale aku i ka pōʻino wafer

Ma ka hoʻohana ʻana i nā kiʻi CAD a i ʻole nā hiʻohiʻona 3D i hāʻawi ʻia e nā mea kūʻai aku, hiki i kā mākou mea ʻenekini ke hoʻopaʻa i kēlā me kēia lima fork no ke kaumaha, ikaika, a me ka maʻemaʻe.

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ʻO nā mea maikaʻi o nā mea hoʻopau hope Ceramic

Hiʻona	Pōmaikaʻi
Kiekie Mechanical Rigidity	E mālama i ka pololei dimensional ma lalo o nā mana hoʻouka robotic
Hana wela maikaʻi	Hana hilinaʻi ʻia ma nā wahi kiʻekiʻe a i ʻole plasma
ʻO ka hoʻohaumia metala ʻole	ʻAʻohe pilikia o ka hoʻohaumia ʻana i ka ion i ka hana semiconductor koʻikoʻi
Ili Pilikino Haʻahaʻa	Hoʻemi i ka pōʻino ma luna o ka wafer a i ʻole ke aniani substrates
Anti-Static a me Non-Magnetic	ʻAʻole ia e huki i ka lepo a i ʻole e hoʻopili i nā ʻāpana magnetic-sensitive
Ola Hana lōʻihi	ʻOi aku ka maikaʻi o ka hoʻohana ʻana i ka pale ʻana i nā pōʻai automation kiʻekiʻe
Hoʻolikelike-Maʻemaʻe	Kūpono no nā lumi maʻemaʻe ISO 14644 (Papa 100 a ma lalo)

Hoʻohālikelike ʻia me nā lima plastic a alumini paha, hāʻawi ka alumina ceramic i ka hoʻomaikaʻi maikaʻi ʻana i ke kino a me ke kūpaʻa kino me ka liʻiliʻi o ka mālama pono.

Waiwai	Lima Metala	Lima ʻili	ʻO ka Lima Ceramic Alumina
ʻoʻoleʻa	Kaumaha	Haʻahaʻa	Kiʻekiʻe loa (Mohs 9)
Paʻa wela	≤ 500°C	≤ 150°C	≥ 1600°C
Palekana Kemika	Kaumaha	ʻilihune	maikaʻi loa
Pono ka lumi hoʻomaʻemaʻe	Kauwaena	Haʻahaʻa	Kiekie loa
ʻAʻahu Kūʻē	Kauwaena	Haʻahaʻa	Kūlana
Ka ikaika dielectric	Haʻahaʻa	Kauwaena	Kiʻekiʻe
Mīkini Mīkini Pono	kaupalena	Kaumaha	Kiʻekiʻe (± 0.01mm hiki ke hiki)

Nā Kūlana ʻenehana

ʻĀpana	Waiwai
Mea waiwai	Alumina maʻemaʻe kiʻekiʻe (≥ 99.5%)
Ka Mahana Hana	A hiki i 1600°C
ʻAole ʻili	Ra ≤ 0.2 µm (koe)
Nā Nui Wafer kūpono	2" a hiki i ka 12" a maʻamau
Hoʻomanawanui Palahalaha	±0.01 mm (pili i ka noi)
Kākoʻo ʻūhā ʻūhā	Nā ala koho, hiki ke hoʻololi ʻia
Nā koho kau ʻana	ʻO nā puka paʻa, nā flange, nā puka puka

Nā nīnau i nīnau pinepine ʻia (FAQ)

Q1: Hiki ke hoʻohui ʻia ka hopena hopena i nā ʻōnaehana robotic i kēia manawa?
A1:ʻAe. Kākoʻo mākou i ka hana maʻamau e pili ana i kāu interface robotic. Hiki iā ʻoe ke hoʻouna iā mākou i kahi kiʻi CAD a i ʻole nā ana flange no ka hoʻoponopono pololei ʻana.

Q2: E haki maʻalahi nā lima seramika i ka wā e hoʻohana ai?
A2:ʻOiai he palupalu ka ceramic ma ke ʻano, hoʻohana kā mākou mau hoʻolālā i ka geometry i hoʻopaʻa ʻia e hōʻemi i ke koʻikoʻi koʻikoʻi. Ma lalo o nā kūlana hoʻohana kūpono, hāʻawi lākou i ke ola lawelawe ʻoi aku ka lōʻihi ma mua o ka metala a i ʻole ka plastic.

Q3: Hiki paha ke hoʻohana i kēia i loko o nā keʻena etching ultra-high a i ʻole plasma etching chambers?
A3:ʻAe. ʻAʻole hiki ke hoʻokuʻu ʻia ka alumini ceramic, kūpaʻa ka wela a me ka pale ʻana i ka corrosion-kūpono loa i nā kaiapuni kiʻekiʻe, ʻea kinoea reactive, a i ʻole plasma.

Q4: Pehea e hoʻomaʻemaʻe a mālama ʻia ai kēia mau mea?
A4:Hiki ke hoʻomaʻemaʻe ʻia me ka hoʻohana ʻana i ka wai DI, ka waiʻona, a i ʻole nā mea holoi hoʻomaʻemaʻe kūpono. ʻAʻole pono ka mālama kūikawā ma muli o ko lākou kūpaʻa kemika a me ka ʻili inert.

E pili ana iā mākou

Hoʻokumu ʻo XKH i ka hoʻomohala ʻenehana kiʻekiʻe, ka hana ʻana, a me ke kūʻai ʻana i nā aniani optical kūikawā a me nā mea aniani hou. Hāʻawi kā mākou huahana i nā uila uila, nā mea hoʻohana uila, a me ka pūʻali koa. Hāʻawi mākou i nā ʻāpana optical Sapphire, nā uhi kelepona kelepona paʻa, Ceramics, LT, Silicon Carbide SIC, Quartz, a me nā wafer kristal semiconductor. Me ka ʻike akamai a me nā mea hana ʻoki ʻoki, ʻoi aku mākou i ka hoʻoili huahana maʻamau ʻole, me ka manaʻo e lilo i alakaʻi optoelectronic material high-tech ʻoihana.