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ʻO nā Wafers Quartz Fused Kiʻekiʻe-Maʻemaʻe no Semiconductor, Photonics Optical Applications 2″4″6″8″12″

Nā Wafers Quartz Fused Kiʻekiʻe-Maʻemaʻe no nā Semiconductor, nā noi Photonics Optical 2″4″6″8″12″ Kiʻi i hōʻike ʻia
  • ʻO nā Wafers Quartz Fused Kiʻekiʻe-Maʻemaʻe no Semiconductor, Photonics Optical Applications 2″4″6″8″12″
  • ʻO nā Wafers Quartz Fused Kiʻekiʻe-Maʻemaʻe no Semiconductor, Photonics Optical Applications 2″4″6″8″12″
  • ʻO nā Wafers Quartz Fused Kiʻekiʻe-Maʻemaʻe no Semiconductor, Photonics Optical Applications 2″4″6″8″12″
  • ʻO nā Wafers Quartz Fused Kiʻekiʻe-Maʻemaʻe no Semiconductor, Photonics Optical Applications 2″4″6″8″12″

Wehewehe Pōkole:

Quartz i hoʻohui ʻia—ʻike ʻia hoʻi ʻoSilica i hoʻohui ʻia—ʻo ia ke ʻano non-crystalline (amorphous) o ka silicon dioxide (SiO₂). ʻAʻole e like me ka borosilicate a i ʻole nā ​​​​aniani ʻoihana ʻē aʻe, ʻaʻohe dopants a i ʻole nā ​​​​mea hoʻohui i loko o ka quartz fused, e hāʻawi ana i kahi hui maʻemaʻe kemika o SiO₂. Ua kaulana ia no kāna hoʻoili optical kūikawā ma waena o nā ultraviolet (UV) a me nā infrared (IR) spectrums, e ʻoi aku ana ma mua o nā mea aniani kuʻuna.


Nā hiʻohiʻona

Kiʻikuhi kikoʻī

Nā Wafers Aniani Quartz Silica i hoʻohui ʻia a me Optical-2
ʻO ka wafer silica fused_quartz_4 ʻīniha

ʻIkepili o ke Aniani Quartz

ʻO nā wafers Quartz ke kumu o nā mea hana hou he nui ʻole e hoʻokele nei i ka honua kikohoʻe o kēia lā. Mai ka hoʻokele ʻana i kāu kelepona akamai a hiki i ke kumu o nā kikowaena kumu 5G, hāʻawi mālie ʻo quartz i ke kūpaʻa, ka maʻemaʻe, a me ka pololei e pono ai i nā mea uila hana kiʻekiʻe a me nā photonics. Inā paha e kākoʻo ana i ka circuitry flexible, e hiki ai i nā sensor MEMS, a i ʻole ke hoʻokumu ʻana i ke kumu no ka helu quantum, ʻo nā ʻano kūikawā o quartz e lilo ia i mea nui loa ma nā ʻoihana.

ʻO "Fused Silica" a i ʻole "Fused Quartz" ʻo ia ka pae amorphous o ka quartz (SiO2). Ke hoʻohālikelike ʻia me ke aniani borosilicate, ʻaʻohe mea hoʻohui o ka silica fused; no laila aia ia ma kona ʻano maʻemaʻe, ʻo SiO2. ʻOi aku ka kiʻekiʻe o ka hoʻoili ʻana o ka silica fused ma ka spectrum infrared a me ultraviolet i ka hoʻohālikelike ʻia me ke aniani maʻamau. Hana ʻia ka silica fused ma ka hoʻoheheʻe ʻana a me ka hoʻopaʻa hou ʻana i ka ultrapure SiO2. Ma ka ʻaoʻao ʻē aʻe, hana ʻia ka silica fused synthetic mai nā precursors kemika waiwai silicon e like me SiCl4 i gasified a laila oxidized i loko o ka lewa H2 + O2. ʻO ka lepo SiO2 i hana ʻia ma kēia hihia ua hoʻohui ʻia i silica ma kahi substrate. ʻOki ʻia nā poloka silica fused i loko o nā wafers ma hope o ka hoʻopili ʻia ʻana o nā wafers.

Nā Hiʻohiʻona Koʻikoʻi a me nā Pōmaikaʻi o ka Quartz Glass Wafer

  • Maʻemaʻe Loa-Kiʻekiʻe (≥99.99% SiO2)
    Kūpono no nā kaʻina semiconductor maʻemaʻe loa a me nā kaʻina photonics kahi e pono ai ke hoʻēmi i ka haumia o nā mea.

  • Ka laulā hana wela ākea
    Mālama i ka kūpaʻa o ke kūkulu ʻana mai nā mahana cryogenic a hiki i ka 1100°C me ka ʻole o ka warping a i ʻole ka degradation.

  • Ka hoʻoili UV a me IR maikaʻi loa
    Hāʻawi i ka mōakāka optical maikaʻi loa mai ka ultraviolet hohonu (DUV) a hiki i ka infrared kokoke (NIR), e kākoʻo ana i nā noi optical precision.

  • Ka helu hoʻonui wela haʻahaʻa
    Hoʻonui i ke kūpaʻa o ka dimensional ma lalo o nā loli o ka mahana, e hōʻemi ana i ke kaumaha a hoʻomaikaʻi i ka hilinaʻi o ke kaʻina hana.

  • Ke kūpaʻa kemika kiʻekiʻe loa
    ʻAʻole i paʻa i ka hapa nui o nā waikawa, nā alkalis, a me nā mea hoʻoheheʻe—he mea kūpono ia no nā wahi hoʻoulu kemika.

  • Ka Hoʻololi ʻana o ka ʻIli
    Loaʻa me nā ʻokiʻoki poli ʻia me ka laumania loa, ʻaoʻao hoʻokahi a ʻaoʻao pālua paha, kūpono me nā koi photonics a me MEMS.

Kaʻina Hana Hana o ka Quartz Glass Wafer

Hoʻokumu ʻia nā wafers quartz i hoʻopili ʻia ma o kahi ʻano o nā ʻanuʻu i kāohi ʻia a pololei hoʻi:

  1. Koho Mea Maka
    Ke koho ʻana o nā kumu quartz kūlohelohe kiʻekiʻe a i ʻole nā ​​​​kumu SiO₂ synthetic.

  2. Ka Hoʻoheheʻe ʻana a me ka Fusion
    Hoʻoheheʻe ʻia ka Quartz ma ~2000°C i loko o nā umu uila ma lalo o kahi lewa i kāohi ʻia e hoʻopau i nā hoʻokomo a me nā pehu.

  3. Ka Hoʻokumu ʻana i nā Poloka
    Hoʻomaʻalili ʻia ka silica heheʻe i loko o nā poloka paʻa a i ʻole nā ​​​​ingots.

  4. ʻOki ʻana i ka Wafer
    Hoʻohana ʻia nā ʻoki daimana kikoʻī a i ʻole nā ​​​​ʻoki uea e ʻoki i nā ʻots i loko o nā wafer blanks.

  5. Ka Lapping & Polishing
    Ua hoʻopālahalaha ʻia a hoʻowali ʻia nā ʻili ʻelua e hoʻokō i nā kikoʻī optical, mānoanoa, a me ka ʻoʻoleʻa pololei.

  6. Hoʻomaʻemaʻe a me ka nānā ʻana
    Hoʻomaʻemaʻe ʻia nā wafers ma nā lumi maʻemaʻe ISO Class 100/1000 a ua nānā pono ʻia no nā kīnā a me ke kūlike o nā ana.

Nā Waiwai o ka Wafer Aniani Quartz

kikoʻī ʻāpana 4" 6" 8" 10" 12"
Anawaena / nui (a i ʻole huinahā) mm 100 150 200 250 300
Hoʻomanawanui (±) mm 0.2 0.2 0.2 0.2 0.2
Mānoanoa mm 0.10 a ʻoi aku paha 0.30 a ʻoi aku paha 0.40 a ʻoi aku paha 0.50 a ʻoi aku paha 0.50 a ʻoi aku paha
Pālahalaha kuhikuhi mua mm 32.5 57.5 Hapa-ʻoki Hapa-ʻoki Hapa-ʻoki
LTV (5mm × 5mm) μm < 0.5 < 0.5 < 0.5 < 0.5 < 0.5
TTV μm < 2 < 3 < 3 < 5 < 5
Kakaka μm ±20 ±30 ±40 ±40 ±40
ʻŌwiliwili μm ≤ 30 ≤ 40 ≤ 50 ≤ 50 ≤ 50
PLTV (5mm × 5mm) < 0.4μm % ≥95% ≥95% ≥95% ≥95% ≥95%
Ka Hoʻopōʻai ʻana i ka Lihi mm Kūlike me ke kūlana SEMI M1.2 / e nānā i ka IEC62276
ʻAno ʻIli ʻAoʻao hoʻokahi i hoʻowali ʻia / ʻAoʻao pālua i hoʻowali ʻia
ʻAoʻao i hoʻopololei ʻia ʻo Ra nm ≤1 ≤1 ≤1 ≤1 ≤1
Nā Kūlana ʻAoʻao Hope μm laulā 0.2-0.7 a i hoʻopilikino ʻia paha

Quartz vs. Nā Mea Moakaka ʻē aʻe

Waiwai Aniani Quartz Aniani Borosilicate Sapeiro Aniani Maʻamau
Mahana Hana Loa ~1100°C ~500°C ~2000°C ~200°C
Hoʻoili UV Maikaʻi loa (JGS1) ʻilihune Maikaʻi loa ʻilihune loa
Ke kū'ē kemika Maikaʻi loa Waena Maikaʻi loa ʻilihune
Maʻemaʻe Kiʻekiʻe loa Haʻahaʻa a waena paha Kiʻekiʻe Haʻahaʻa
Hoʻonui Wela Haʻahaʻa loa Waena Haʻahaʻa Kiʻekiʻe
Kumukūʻai Waena a kiʻekiʻe Haʻahaʻa Kiʻekiʻe Haʻahaʻa loa

Nā nīnau i nīnau pinepine ʻia no ka Quartz Glass Wafer

Q1: He aha ka ʻokoʻa ma waena o ka quartz i hoʻohui ʻia a me ka silica i hoʻohui ʻia?
ʻOiai ʻo nā ʻano amorphous ʻelua o SiO₂, ʻo ka quartz fused ka mea maʻamau i loaʻa mai nā kumu quartz kūlohelohe, ʻoiai ua hana ʻia ka silica fused ma ke ʻano synthetically. Ma ke ʻano hana, hāʻawi lākou i ka hana like, akā ʻoi aku ka kiʻekiʻe o ka maʻemaʻe a me ka homogeneity o ka silica fused.

Q2: Hiki ke hoʻohana ʻia nā wafers quartz i hoʻopili ʻia i nā wahi vacuum kiʻekiʻe?
ʻAe. Ma muli o ko lākou mau waiwai hoʻokuʻu haʻahaʻa a me ke kūpaʻa wela kiʻekiʻe, maikaʻi loa nā wafers quartz fused no nā ʻōnaehana vacuum a me nā noi aerospace.

Q3: He kūpono anei kēia mau wafers no nā noi laser UV hohonu?
ʻAe loa. Loaʻa i ka quartz fused ka transmittance kiʻekiʻe a hiki i ~185 nm, e kūpono ana no nā optics DUV, nā masks lithography, a me nā ʻōnaehana laser excimer.

Q4: Ke kākoʻo nei ʻoe i ka hana wafer maʻamau?
ʻAe. Hāʻawi mākou i ka hoʻopilikino piha ʻana me ke anawaena, ka mānoanoa, ka maikaʻi o ka ʻili, nā pālahalaha/notches, a me ke ʻano laser, ma muli o kāu mau koi noi kikoʻī.

E pili ana iā mākou

He loea ʻo XKH i ka hoʻomohala ʻenehana kiʻekiʻe, ka hana ʻana, a me ke kūʻai aku ʻana i ke aniani optical kūikawā a me nā mea kristal hou. Lawelawe kā mākou huahana i nā mea uila optical, nā mea uila mea kūʻai aku, a me ka pūʻali koa. Hāʻawi mākou i nā ʻāpana optical Sapphire, nā uhi lens kelepona paʻalima, Ceramics, LT, Silicon Carbide SIC, Quartz, a me nā wafers kristal semiconductor. Me ka ʻike loea a me nā lako hana kiʻekiʻe, ʻoi aku mākou i ka hana ʻana i nā huahana maʻamau ʻole, me ka manaʻo e lilo i alakaʻi i nā mea optoelectronic ʻoihana ʻenehana kiʻekiʻe.

 

ʻO Sapphire Wafer Blank High Purity Raw Sapphire Substrate No ka Hana ʻana 5

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