12'īniha Sapphire Wafer C-Plane SSP/DSP
Kiʻikuhi kikoʻī
Hoʻolauna Sapphire
ʻO ka sapphire wafer kahi mea substrate kristal hoʻokahi i hana ʻia mai ka alumini oxide synthetic kiʻekiʻe (Al₂O₃). Hoʻoulu ʻia nā kristal sapphire nui me ka hoʻohana ʻana i nā ʻano holomua e like me Kyropoulos (KY) a i ʻole Heat Exchange Method (HEM), a laila hana ʻia ma o ka ʻoki ʻana, ke kuhikuhi ʻana, ka wili ʻana, a me ka polishing pololei. Ma muli o kona mau waiwai kino, optical, a me ke kemika kūikawā, hoʻokani ka sapphire wafer i kahi kuleana nui i nā kahua o semiconductors, optoelectronics, a me nā mea uila mea kūʻai kiʻekiʻe.
Nā ʻAno Hana Hana Sapphire Mainstream
| ʻAno hana | Kumumanaʻo | Nā Pōmaikaʻi | Nā Noi Nui |
|---|---|---|---|
| ʻAno Verneuil(Flame Fusion) | Hoʻoheheʻe ʻia ka pauka Al₂O₃ kiʻekiʻe i loko o ka lapalapa oxyhydrogen, hoʻopaʻa nā kulu liʻiliʻi papa ma ka papa ma luna o kahi hua. | Kumukūʻai haʻahaʻa, pono kiʻekiʻe, kaʻina hana maʻalahi | Nā sapeiro maikaʻi loa, nā mea ʻike maka mua |
| Ke ʻAno Czochralski (CZ) | Hoʻoheheʻe ʻia ʻo Al₂O₃ i loko o kahi ipu hoʻoheheʻe, a huki mālie ʻia kahi kristal hua i luna e hoʻoulu i ke kristal | Hoʻopuka i nā kristal nui me ka kūpaʻa maikaʻi | Nā kristal laser, nā puka makani optical |
| Ke ʻAno Hana Kyropoulos (KY) | ʻO ka hoʻoluʻolu lohi i kāohi ʻia e ʻae i ke kristal e ulu mālie i loko o ke kapuahi | Hiki ke ulu i nā kristal nui, haʻahaʻa haʻahaʻa (ʻumi kilokani a ʻoi aku paha) | Nā substrates LED, nā pale kelepona akamai, nā ʻāpana optical |
| Ke ʻAno HEM(Hoʻololi Wela) | Hoʻomaka ka hoʻoluʻolu mai ka piko o ke ipu hoʻoheheʻe, ulu nā kristal i lalo mai ka hua | Hoʻopuka i nā kristal nui loa (a hiki i nā haneli kilokani) me ke ʻano like | Nā puka makani ʻōlinolino nui, aerospace, nā ʻōlinolino koa |
Kūlana Kila
| Kūlana / Paepae | Papa Kuhikuhi Miller | Nā ʻano | Nā Noi Nui |
|---|---|---|---|
| mokulele C | (0001) | Kūlike i ke axis c, ʻili polar, ua hoʻonohonoho like ʻia nā ʻātoma | LED, diodes laser, GaN epitaxial substrates (i hoʻohana nui ʻia) |
| mokulele A | (11-20) | ʻO ka ʻili non-polar e kūlike ana i ka c-axis, e pale ana i nā hopena polarization | ʻO nā mea hana optoelectronic, ʻaʻohe polar GaN epitaxy |
| mokulele M | (10-10) | ʻO ke kūlike me ke axis c, non-polar, symmetry kiʻekiʻe | Nā polokalamu optoelectronic GaN epitaxy hana kiʻekiʻe |
| mokulele R | (1-102) | Hoʻopili ʻia i ka c-axis, nā waiwai optical maikaʻi loa | Nā puka makani ʻōlinolino, nā mea ʻike infrared, nā ʻāpana laser |
ʻO ke kikoʻī o ka Sapphire Wafer (Hiki ke hoʻopilikino ʻia)
| Mea | Nā Wafers Sapphire 1-'īniha C-plane(0001) 430μm | |
| Nā Mea Crystal | 99,999%, Maʻemaʻe Kiʻekiʻe, Monocrystalline Al2O3 | |
| Papa | Kuhina Nui, Mākaukau ʻo Epi | |
| Kūlana ʻIli | C-plane(0001) | |
| Ke kihi ʻole o ka mokulele C i ke axis M 0.2 +/- 0.1° | ||
| Anawaena | 25.4 mm +/- 0.1 mm | |
| Mānoanoa | 430 μm +/- 25 μm | |
| ʻAoʻao hoʻokahi i hoʻopololei ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (SSP) | ʻIli Hope | ʻO ka lepo maikaʻi, Ra = 0.8 μm a i 1.2 μm |
| ʻAoʻao pālua i hoʻopili ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (DSP) | ʻIli Hope | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| TTV | < 5 μm | |
| KAKAUOHA | < 5 μm | |
| WARP | < 5 μm | |
| Hoʻomaʻemaʻe / Hoʻopili ʻana | Papa 100 ka hoʻomaʻemaʻe lumi maʻemaʻe a me ka hoʻopili ʻana i ka vacuum, | |
| 25 mau ʻāpana i loko o hoʻokahi pahu cassette a i ʻole ka pahu hoʻokahi. | ||
| Mea | Nā Wafers Sapphire 2-'īniha C-plane(0001) 430μm | |
| Nā Mea Crystal | 99,999%, Maʻemaʻe Kiʻekiʻe, Monocrystalline Al2O3 | |
| Papa | Kuhina Nui, Mākaukau ʻo Epi | |
| Kūlana ʻIli | C-plane(0001) | |
| Ke kihi ʻole o ka mokulele C i ke axis M 0.2 +/- 0.1° | ||
| Anawaena | 50.8 mm +/- 0.1 mm | |
| Mānoanoa | 430 μm +/- 25 μm | |
| Kūlana Pālahalaha Mua | Papahele-A (11-20) +/- 0.2° | |
| Ka Lōʻihi Palahalaha Mua | 16.0 mm +/- 1.0 mm | |
| ʻAoʻao hoʻokahi i hoʻopololei ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (SSP) | ʻIli Hope | ʻO ka lepo maikaʻi, Ra = 0.8 μm a i 1.2 μm |
| ʻAoʻao pālua i hoʻopili ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (DSP) | ʻIli Hope | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| TTV | < 10 μm | |
| KAKAUOHA | < 10 μm | |
| WARP | < 10 μm | |
| Hoʻomaʻemaʻe / Hoʻopili ʻana | Papa 100 ka hoʻomaʻemaʻe lumi maʻemaʻe a me ka hoʻopili ʻana i ka vacuum, | |
| 25 mau ʻāpana i loko o hoʻokahi pahu cassette a i ʻole ka pahu hoʻokahi. | ||
| Mea | Nā Wafers Sapphire 3-'īniha C-plane(0001) 500μm | |
| Nā Mea Crystal | 99,999%, Maʻemaʻe Kiʻekiʻe, Monocrystalline Al2O3 | |
| Papa | Kuhina Nui, Mākaukau ʻo Epi | |
| Kūlana ʻIli | C-plane(0001) | |
| Ke kihi ʻole o ka mokulele C i ke axis M 0.2 +/- 0.1° | ||
| Anawaena | 76.2 mm +/- 0.1 mm | |
| Mānoanoa | 500 μm +/- 25 μm | |
| Kūlana Pālahalaha Mua | Papahele-A (11-20) +/- 0.2° | |
| Ka Lōʻihi Palahalaha Mua | 22.0 mm +/- 1.0 mm | |
| ʻAoʻao hoʻokahi i hoʻopololei ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (SSP) | ʻIli Hope | ʻO ka lepo maikaʻi, Ra = 0.8 μm a i 1.2 μm |
| ʻAoʻao pālua i hoʻopili ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (DSP) | ʻIli Hope | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| TTV | < 15 μm | |
| KAKAUOHA | < 15 μm | |
| WARP | < 15 μm | |
| Hoʻomaʻemaʻe / Hoʻopili ʻana | Papa 100 ka hoʻomaʻemaʻe lumi maʻemaʻe a me ka hoʻopili ʻana i ka vacuum, | |
| 25 mau ʻāpana i loko o hoʻokahi pahu cassette a i ʻole ka pahu hoʻokahi. | ||
| Mea | Nā Wafers Sapphire 650μm C-plane 4-'īniha (0001) | |
| Nā Mea Crystal | 99,999%, Maʻemaʻe Kiʻekiʻe, Monocrystalline Al2O3 | |
| Papa | Kuhina Nui, Mākaukau ʻo Epi | |
| Kūlana ʻIli | C-plane(0001) | |
| Ke kihi ʻole o ka mokulele C i ke axis M 0.2 +/- 0.1° | ||
| Anawaena | 100.0 mm +/- 0.1 mm | |
| Mānoanoa | 650 μm +/- 25 μm | |
| Kūlana Pālahalaha Mua | Papahele-A (11-20) +/- 0.2° | |
| Ka Lōʻihi Palahalaha Mua | 30.0 mm +/- 1.0 mm | |
| ʻAoʻao hoʻokahi i hoʻopololei ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (SSP) | ʻIli Hope | ʻO ka lepo maikaʻi, Ra = 0.8 μm a i 1.2 μm |
| ʻAoʻao pālua i hoʻopili ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (DSP) | ʻIli Hope | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| TTV | < 20 μm | |
| KAKAUOHA | < 20 μm | |
| WARP | < 20 μm | |
| Hoʻomaʻemaʻe / Hoʻopili ʻana | Papa 100 ka hoʻomaʻemaʻe lumi maʻemaʻe a me ka hoʻopili ʻana i ka vacuum, | |
| 25 mau ʻāpana i loko o hoʻokahi pahu cassette a i ʻole ka pahu hoʻokahi. | ||
| Mea | Nā Wafers Sapphire 6-'īniha C-plane(0001) 1300μm | |
| Nā Mea Crystal | 99,999%, Maʻemaʻe Kiʻekiʻe, Monocrystalline Al2O3 | |
| Papa | Kuhina Nui, Mākaukau ʻo Epi | |
| Kūlana ʻIli | C-plane(0001) | |
| Ke kihi ʻole o ka mokulele C i ke axis M 0.2 +/- 0.1° | ||
| Anawaena | 150.0 mm +/- 0.2 mm | |
| Mānoanoa | 1300 μm +/- 25 μm | |
| Kūlana Pālahalaha Mua | Papahele-A (11-20) +/- 0.2° | |
| Ka Lōʻihi Palahalaha Mua | 47.0 mm +/- 1.0 mm | |
| ʻAoʻao hoʻokahi i hoʻopololei ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (SSP) | ʻIli Hope | ʻO ka lepo maikaʻi, Ra = 0.8 μm a i 1.2 μm |
| ʻAoʻao pālua i hoʻopili ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (DSP) | ʻIli Hope | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| TTV | < 25 μm | |
| KAKAUOHA | < 25 μm | |
| WARP | < 25 μm | |
| Hoʻomaʻemaʻe / Hoʻopili ʻana | Papa 100 ka hoʻomaʻemaʻe lumi maʻemaʻe a me ka hoʻopili ʻana i ka vacuum, | |
| 25 mau ʻāpana i loko o hoʻokahi pahu cassette a i ʻole ka pahu hoʻokahi. | ||
| Mea | Nā Wafers Sapphire 8-'īniha C-plane (0001) 1300μm | |
| Nā Mea Crystal | 99,999%, Maʻemaʻe Kiʻekiʻe, Monocrystalline Al2O3 | |
| Papa | Kuhina Nui, Mākaukau ʻo Epi | |
| Kūlana ʻIli | C-plane(0001) | |
| Ke kihi ʻole o ka mokulele C i ke axis M 0.2 +/- 0.1° | ||
| Anawaena | 200.0 mm +/- 0.2 mm | |
| Mānoanoa | 1300 μm +/- 25 μm | |
| ʻAoʻao hoʻokahi i hoʻopololei ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (SSP) | ʻIli Hope | ʻO ka lepo maikaʻi, Ra = 0.8 μm a i 1.2 μm |
| ʻAoʻao pālua i hoʻopili ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (DSP) | ʻIli Hope | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| TTV | < 30 μm | |
| KAKAUOHA | < 30 μm | |
| WARP | < 30 μm | |
| Hoʻomaʻemaʻe / Hoʻopili ʻana | Papa 100 ka hoʻomaʻemaʻe lumi maʻemaʻe a me ka hoʻopili ʻana i ka vacuum, | |
| Pūʻolo ʻāpana hoʻokahi. | ||
| Mea | Nā Wafers Sapphire 12-'īniha C-plane(0001) 1300μm | |
| Nā Mea Crystal | 99,999%, Maʻemaʻe Kiʻekiʻe, Monocrystalline Al2O3 | |
| Papa | Kuhina Nui, Mākaukau ʻo Epi | |
| Kūlana ʻIli | C-plane(0001) | |
| Ke kihi ʻole o ka mokulele C i ke axis M 0.2 +/- 0.1° | ||
| Anawaena | 300.0 mm +/- 0.2 mm | |
| Mānoanoa | 3000 μm +/- 25 μm | |
| ʻAoʻao hoʻokahi i hoʻopololei ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (SSP) | ʻIli Hope | ʻO ka lepo maikaʻi, Ra = 0.8 μm a i 1.2 μm |
| ʻAoʻao pālua i hoʻopili ʻia | ʻIli mua | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| (DSP) | ʻIli Hope | ʻEpi-polished, Ra < 0.2 nm (e AFM) |
| TTV | < 30 μm | |
| KAKAUOHA | < 30 μm | |
| WARP | < 30 μm | |
Kaʻina Hana Hana Wafer Sapphire
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Ka ulu ʻana o ke aniani
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E ulu i nā boules sapphire (100–400 kg) me ka hoʻohana ʻana i ke ʻano Kyropoulos (KY) i loko o nā umu ulu kristal i hoʻolaʻa ʻia.
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ʻEli a me ke Hoʻoponopono ʻana i ka Ingot
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E hoʻohana i kahi barela wili e hana i ka boule i loko o nā ʻāpana cylindrical me ke anawaena o 2-6 ʻīniha a me ka lōʻihi o 50-200 mm.
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Hoʻoheheʻe mua ʻia
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E nānā i nā ʻots no nā hemahema a hana i ka annealing wela kiʻekiʻe mua e hōʻoluʻolu i ke kaumaha o loko.
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Kūlana Kila
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E hoʻoholo i ke kuhikuhi pololei o ka ingot sapphire (e laʻa, C-plane, A-plane, R-plane) me ka hoʻohana ʻana i nā mea hana kuhikuhi.
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ʻOki ʻana i ka ʻoki ʻana i nā uea he nui
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E ʻokiʻoki i ka ingot i mau wafers lahilahi e like me ka mānoanoa e pono ai me ka hoʻohana ʻana i nā mea ʻoki multi-wire.
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Nānā mua a me ka lua o ka hoʻoheheʻe ʻana
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E nānā i nā wafers i ʻoki ʻia (mānoanoa, pālahalaha, kīnā o ka ʻili).
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E hana hou i ka annealing inā pono e hoʻomaikaʻi hou aku i ka maikaʻi o ke kristal.
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Ka hoʻokaʻawale ʻana, ka wili ʻana a me ka hoʻopili ʻana o CMP
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Hana i ka chamfering, wili ʻili, a me ka polishing mechanical chemical (CMP) me nā lako hana kūikawā e hoʻokō ai i nā ʻili e like me ke aniani.
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Hoʻomaʻemaʻe
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E hoʻomaʻemaʻe pono i nā wafers me ka hoʻohana ʻana i ka wai maʻemaʻe loa a me nā kemika i loko o kahi lumi maʻemaʻe e wehe i nā ʻāpana a me nā mea haumia.
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Nānā ʻIke a me ke Kino
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E hana i ka ʻike transmittance a hoʻopaʻa i ka ʻikepili optical.
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E ana i nā palena wafer e pili ana iā TTV (Total Thickness Variation), Bow, Warp, pololei o ke kuhikuhi ʻana, a me ka ʻoʻoleʻa o ka ʻili.
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Uhi ʻana (Koho)
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E hoʻopili i nā uhi (e like me nā uhi AR, nā papa pale) e like me nā kikoʻī o ka mea kūʻai aku.
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Nānā Hope Loa a me ka Hoʻopili ʻana
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E hana i ka nānā pono 100% i loko o kahi lumi maʻemaʻe.
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E hoʻopaʻa i nā wafers i loko o nā pahu cassette ma lalo o nā kūlana maʻemaʻe Class-100 a sila iā lākou me ka mīkini ʻūlū ma mua o ka hoʻouna ʻana.
Nā noi o nā Wafers Sapphire
ʻO nā wafers sapphire, me ko lākou paʻakikī koʻikoʻi, ka transmittance optical koʻikoʻi, ka hana thermal maikaʻi loa, a me ka insulation uila, ua hoʻohana nui ʻia ma nā ʻoihana he nui. ʻAʻole wale kā lākou noi e uhi i nā ʻoihana LED kuʻuna a me nā optoelectronic akā ke hoʻonui nei hoʻi i nā semiconductors, nā mea uila mea kūʻai aku, a me nā kahua aerospace a me nā pale kaua holomua.
1. Nā Semiconductors a me nā Optoelectronics
Nā Substrates LED
ʻO nā wafers sapphire nā substrates mua no ka ulu ʻana o ka gallium nitride (GaN) epitaxial, i hoʻohana nui ʻia i nā LED polū, nā LED keʻokeʻo, a me nā ʻenehana Mini/Micro LED.
Nā Diode Laser (LD)
Ma ke ʻano he substrates no nā diode laser e pili ana iā GaN, kākoʻo nā wafers sapphire i ka hoʻomohala ʻana o nā mea hana laser mana kiʻekiʻe a lōʻihi ke ola.
Nā mea nānā kiʻi
I nā photodetectors ultraviolet a me infrared, hoʻohana pinepine ʻia nā wafers sapphire e like me nā puka makani moakaka a me nā substrates insulating.
2. Nā Mea Hana Semiconductor
Nā RFIC (Nā Kaapuni Hoʻohui Alapine Lekiō)
Mahalo i ko lākou pale uila maikaʻi loa, he mau substrates kūpono nā wafers sapphire no nā mea hana microwave kiʻekiʻe-alapine (frequency) a me ka mana kiʻekiʻe.
ʻenehana Silicon-ma-Sapphire (SoS)
Ma ka hoʻopili ʻana i ka ʻenehana SoS, hiki ke hoʻemi nui ʻia ka capacitance parasitic, e hoʻonui ana i ka hana kaapuni. Hoʻohana nui ʻia kēia i nā kamaʻilio RF a me nā mea uila aerospace.
3. Nā noi ʻōniʻoniʻo
Nā Puka makani ʻōlinolino infrared
Me ka transmittance kiʻekiʻe ma ka pae nalu 200 nm–5000 nm, hoʻohana nui ʻia ka sapphire i nā mea ʻike infrared a me nā ʻōnaehana alakaʻi infrared.
Nā Puka makani Laser Mana Kiʻekiʻe
ʻO ka paʻakikī a me ke kūpaʻa wela o ka sapeiro e hoʻolilo ia i mea maikaʻi loa no nā puka makani pale a me nā aniani i nā ʻōnaehana laser mana kiʻekiʻe.
4. Nā Uila Mea kūʻai aku
Nā Uhi Lens Kāmela
ʻO ka paʻakikī kiʻekiʻe o ka sapeiro e hōʻoiaʻiʻo ana i ke kūpaʻa ʻana i ke kahakaha no nā aniani kelepona a me nā kāmela.
Nā Mea ʻIke Manamana Lima
Hiki i nā wafers sapphire ke lawelawe ma ke ʻano he mau uhi paʻa a moakaka hoʻi e hoʻomaikaʻi ai i ka pololei a me ka hilinaʻi i ka ʻike ʻana i nā manamana lima.
Nā Uaki Akamai a me nā Hōʻikeʻike Premium
Hoʻohui nā pale sapphire i ke kūpaʻa ʻana i ke kahakaha me ka mōakāka optical kiʻekiʻe, e hoʻolilo ana iā lākou i mea kaulana i nā huahana uila kiʻekiʻe.
5. Aerospace a me ka Pale Kaua
Nā Dome Infrared Missile
Noho moakaka a paʻa nā puka makani sapphire ma lalo o ke ana wela kiʻekiʻe a me nā kūlana wikiwiki.
Nā ʻōnaehana Optical Aerospace
Hoʻohana ʻia lākou i nā puka makani optical ikaika kiʻekiʻe a me nā lako nānā i hoʻolālā ʻia no nā wahi koʻikoʻi.
Nā Huahana Sapphire Maʻamau ʻē aʻe
Nā Huahana Optical
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Nā Puka Aniani Sapphire
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Hoʻohana ʻia i loko o nā lasers, spectrometers, nā ʻōnaehana kiʻi infrared, a me nā puka makani sensor.
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Ka laulā hoʻoili:UV 150 nm a i ka waena-IR 5.5 μm.
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Nā aniani Sapphire
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Hoʻohana ʻia i nā ʻōnaehana laser mana kiʻekiʻe a me nā optics aerospace.
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Hiki ke hana ʻia ma ke ʻano he aniani convex, concave, a i ʻole cylindrical.
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Nā Prisms Sapphire
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Hoʻohana ʻia i nā mea hana ana optical a me nā ʻōnaehana kiʻi kikoʻī.
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Ka Hoʻopili Huahana
E pili ana iā XINKEHUI
ʻO Shanghai Xinkehui New Material Co., Ltd. kekahi o nā mea hana haleka mea hoʻolako optical & semiconductor nui loa ma Kina, i hoʻokumu ʻia i ka makahiki 2002. Ua hoʻomohala ʻia ʻo XKH e hāʻawi i nā mea noiʻi kula me nā wafers a me nā mea ʻepekema ʻē aʻe e pili ana i ka semiconductor a me nā lawelawe. ʻO nā mea Semiconductor kā mākou ʻoihana nui, ua hoʻokumu ʻia kā mākou hui ma ke ʻano loea, mai kona hoʻokumu ʻia ʻana, ua komo nui ʻo XKH i ka noiʻi a me ka hoʻomohala ʻana i nā mea uila holomua, ʻoi aku hoʻi ma ke kahua o nā wafer / substrate like ʻole.
Nā Hoa
Me kāna ʻenehana mea semiconductor maikaʻi loa, ua lilo ʻo Shanghai Zhimingxin i hoa hilinaʻi o nā ʻoihana kiʻekiʻe o ka honua a me nā ʻoihana hoʻonaʻauao kaulana. Me kona kūpaʻa i ka hana hou a me ka maikaʻi, ua hoʻokumu ʻo Zhimingxin i nā pilina hana like hohonu me nā alakaʻi ʻoihana e like me Schott Glass, Corning, a me Seoul Semiconductor. ʻAʻole wale kēia mau hana like i hoʻomaikaʻi i ka pae loea o kā mākou huahana, akā ua hoʻolaha pū i ka hoʻomohala ʻenehana ma nā kahua o nā mea uila mana, nā mea optoelectronic, a me nā mea semiconductor.
Ma waho aʻe o ka laulima ʻana me nā ʻoihana kaulana, ua hoʻokumu pū ʻo Zhimingxin i nā pilina laulima noiʻi lōʻihi me nā kulanui kiʻekiʻe a puni ka honua e like me ke Kulanui ʻo Harvard, University College London (UCL), a me ke Kulanui o Houston. Ma o kēia mau laulima ʻana, ʻaʻole wale ʻo Zhimingxin e hāʻawi i ke kākoʻo loea no nā papahana noiʻi ʻepekema ma ke kula nui, akā ke komo pū nei hoʻi i ka hoʻomohala ʻana i nā mea hou a me ka hana hou ʻenehana, e hōʻoia ana e noho mau ana mākou ma ke alo o ka ʻoihana semiconductor.
Ma o ka laulima pū ʻana me kēia mau ʻoihana kaulana o ka honua a me nā ʻoihana hoʻonaʻauao, hoʻomau ʻo Shanghai Zhimingxin i ka hoʻolaha ʻana i ka hana hou a me ka hoʻomohala ʻenehana, e hāʻawi ana i nā huahana a me nā hoʻonā papa honua e hoʻokō ai i nā pono e ulu nei o ka mākeke honua.




