Nā huahana
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ʻO ka aniani maka Sic 6SP 10x10x10mmt 4H-SEMI HPSI Ka nui i hoʻopilikino ʻia
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Nā Wafers LiNbO₃ 2'īniha-8'īniha Mānoanoa 0.1 ~ 0.5mm TTV 3µm Hana Maʻamau
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ʻO ka umu ulu SiC Ingot no nā ʻano hana TSSG/LPE Crystal SiC nui-diameter
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ʻO nā lako ʻoki laser infrared Picosecond Dual-Platform no ka hana ʻana i ke aniani Optical / Quartz / Sapphire
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ʻO ka pōhaku makamae kala Synthetic White Sapphire gem no nā mea hoʻonani Free-Size Cutting
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ʻO ka lima hoʻohana hopena seramika SiC no ka lawe ʻana i ka wafer
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4inch 6inch 8inch SiC Crystal Growth Furnace no ke kaʻina hana CVD
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6 ʻīniha 4H SEMI ʻAno SiC composite substrate Mānoanoa 500μm TTV≤5μm MOS grade
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Nā ʻĀpana Sapphire Optical Windows Sapphire i hoʻopilikino ʻia me ka Polishing Precision
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Papa/pā keramika SiC no ka mea paʻa wafer 4'īniha 6'īniha no ICP
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Paʻakikī Kiʻekiʻe o ka Puka makani Sapphire i hoʻonohonoho ʻia no nā pale kelepona
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Nā noi RF hana kiʻekiʻe 12 ʻīniha SiC Substrate N Type Nui