Puka makani ʻōlinolino Ruby Puka makani pale aniani laser Mohs Hardness 9 transmittance kiʻekiʻe
Nā hiʻohiʻona o ka puka makani ʻōnika Ruby:
1. Nā ʻano ʻike maka:
Uhi ka hui transmittance i ka laulā ʻike ʻia o 400-700nm a loaʻa iā ia kahi piko absorption hiʻohiʻona ma 694nm
ʻO ka helu kuhikuhi refractive 1.76 (@589nm), helu kuhikuhi birefractive 0.008, maopopo ka anisotropy
Koho ka uhi ʻili:
ʻO ke kiʻiʻoniʻoni anti-reflection broadband (400-700nm, reflectance awelika < 0.5%)
Kānana kaula haiki (bandwidth ±10nm)
ʻO ke kiʻiʻoniʻoni hoʻomālamalama kiʻekiʻe (reflectance > 99.5% @ wavelength kikoʻī)
2. Nā ʻano mīkini:
Pae paʻakikī Mohs 9, paʻakikī Vickers 2200-2400kg/mm²
Ikaika kūlou > 400MPa, ikaika compressive > 2GPa
Modulus elastic 345GPa, lakio Poisson 0.25
ʻO ka mānoanoa o ka mīkini he 0.3-30mm, ke anawaena a hiki i ka 200mm
3. Nā ʻano wela:
Heheʻe kiko 2050 ℃, mahana hana kiʻekiʻe loa 1800 ℃ (manawa pōkole)
Ka helu hoʻonui wela 5.8 × 10⁻⁶ / K (25-1000 ℃)
Ka hoʻokele wela 35W/(m·K) @25℃
4. Nā waiwai kemika:
Ke kūpaʻa ʻana i ka ʻakika a me ka alkali (koe naʻe ka waikawa hydrofluoric a me ka waikawa sulfuric i hoʻohuihui ʻia)
ʻO ke kūpaʻa oxidation maikaʻi loa, paʻa i ke kaiapuni oxidation wela kiʻekiʻe
ʻO ke kūpaʻa maikaʻi o ka radiation, hiki ke kū i ka mahele radiation 10⁶Gy
Ka hoʻohana ʻana o ka puka makani ʻōpae Ruby:
1. Kahua ʻoihana kiʻekiʻe:
ʻOihana aila a me ke kinoea: Puka makani nānā pale kaomi no nā ʻōnaehana kāmela downhole, a hiki i ke kaomi hana 150MPa
Nā lako kemika: puka makani nānā reactor, kūpaʻa ikaika i ka waikawa a me ka alkali (pH1-14)
Hana ʻana o ka semiconductor: Puka nānā no nā lako hana etching plasma, kū i nā kinoea ʻino e like me CF₄
2. Nā mea hana noiʻi ʻepekema:
Kumu kukui radiation Synchrotron: puka makani kukuna X-ray, hiki ke hoʻouka wela kiʻekiʻe
Mea hana hoʻohuihui nukelea: puka makani nānā hakahaka, kū i ka radiation plasma wela kiʻekiʻe
Hoʻokolohua kaiapuni koʻikoʻi: puka makani nānā lua kiʻekiʻe a me ke ana wela kiʻekiʻe
3. ʻOihana Palekana Lahui:
ʻO ka ʻimi kai hohonu: kū i ke kaomi a hiki i 1000 mau lewa
Mea ʻimi missile: Ke kū'ē nui ʻana i ka overload (> 10000g)
Nā ʻōnaehana mea kaua Laser: puka makani hoʻopuka laser mana kiʻekiʻe
4. Nā Lako Lapaʻau:
Puka makani hoʻopuka o ka laser lapaʻau
Ka puka makani nānā o nā lako autoclave
Nā ʻāpana optical o ka lithotriptor extracorporeal
Nā palena loea:
| Formula Kemika | Ti3+:Al2O3 |
| ʻAno Crystal | Hexagonal |
| Nā Kūlana Paʻa o ka Lattice | a=4.758, c=12.991 |
| Ka nui o ka paʻa | 3.98 g/cm3 |
| Kiko Heheʻe | 2040℃ |
| Paʻakikī Mohs | 9 |
| Hoʻonui Wela | 8.4 x 10-6/℃ |
| Ka Hoʻokele Wela | 52 W/m/K |
| Wela Kūikawā | 0.42 J/g/K |
| Hana Laser | 4-Pae Vibronic |
| Ke ola o ka fluorescence | 3.2μs ma 300K |
| Pae Hoʻonohonoho | 660nm ~ 1050nm |
| Pae Hoʻopili | 400nm ~ 600nm |
| Piko Hoʻokuʻu ʻia | 795 nm |
| Kikowaena Hoʻomoʻa | 488 nm |
| ʻIneki Refractive | 1.76 ma 800nm |
| ʻĀpana Keʻa o ka Piko | 3.4 x 10-19cm2 |
Lawelawe XKH
Hāʻawi ʻo XKH i ka hoʻopilikino piha ʻana o nā puka makani optical ruby: Hoʻokomo pū kēia i ke koho ʻana i nā mea maka (hoʻololi ʻia ka Cr³ concentration 0.05%-0.5%), ka mīkini kikoʻī (mānoanoa ke ahonui ±0.01mm), ka uhi optical (anti-reflection/high reflection/filter film system), ka mālama ʻana i ka lihi (explosion edge design) a me ka hoʻāʻo maikaʻi koʻikoʻi (transmittance, pressure resistance, laser damage threshold tests). Kākoʻo i ka hoʻopilikino nui ʻole (diameter 1-200mm), ka hana hoʻāʻo liʻiliʻi (a hiki i 5 mau ʻāpana) a me ka hana nui, hāʻawi i nā palapala loea piha a me ke kākoʻo ma hope o ke kūʻai aku e hōʻoia i ka hana hilinaʻi o nā huahana ma nā ʻano ʻino like ʻole.
Kiʻikuhi kikoʻī










