Hoʻolako ʻia ka paipu seramika Silicon carbide ceramic tray sucker silikon carbide ceramic tube hoʻolako kiʻekiʻe kiʻekiʻe sintering hana maʻamau
Nā hiʻohiʻona nui:
1. Silicon carbide ceramic pā
- ʻO ka paʻakikī kiʻekiʻe a me ke kūpaʻa ʻana: ua kokoke ka paʻakikī i ke daimana, a hiki ke kū i ka lole mechanical i ka hana wafer no ka manawa lōʻihi.
- ʻO ka conductivity thermal kiʻekiʻe a me ka coefficient hoʻonui haʻahaʻa haʻahaʻa: ka hoʻokuʻu ʻana o ka wela wikiwiki a me ke kūpaʻa dimensional, e pale ana i ka deformation i hana ʻia e ke kaumaha wela.
- ʻO ka palahalaha kiʻekiʻe a me ka hoʻopau ʻana o ka ʻili: ʻO ka palahalaha o ka ʻili a hiki i ka pae micron, e hōʻoiaʻiʻo ana i ka pili piha ma waena o ka wafer a me ka disk, e hōʻemi ana i ka haumia a me ka pōʻino.
Paʻa kemika: Ke kūpaʻa ikaika i ka corrosion, kūpono no ka hoʻomaʻemaʻe pulu a me nā kaʻina hana etching i ka hana semiconductor.
2. ʻO ka pahu silika carbide
- Ke kūpaʻa wela kiʻekiʻe: Hiki iā ia ke hana ma ke ʻano wela kiʻekiʻe ma luna o 1600 ° C no ka manawa lōʻihi, kūpono no ke kaʻina hana semiconductor kiʻekiʻe.
ʻOi aku ka pale ʻana i ka corrosion: kū i ka waika, alkalis a me nā ʻano mea hoʻoheheʻe kemika, kūpono no nā kaʻina hana paʻakikī.
- ʻO ka paʻakikī kiʻekiʻe a me ka pale ʻana i ka lole: pale i ka erosion particle a me ka lole mīkini, hoʻonui i ke ola lawelawe.
- ʻO ka conductivity thermal kiʻekiʻe a me ka coefficient haʻahaʻa o ka hoʻonui ʻana i ka wela: ka lawe wikiwiki ʻana o ka wela a me ke kūpaʻa dimensional, e hōʻemi ana i ka deformation a i ʻole ka haki ʻana ma muli o ke kaumaha wela.
Ka palena huahana:
Pilikino carbide seramika pā palena:
(Waiwai waiwai) | (Ui) | (ssic) | |
(Maʻiʻo SiC) | (Wt)% | >99 | |
(Ka nui o ka palaoa maʻamau) | micron | 4-10 | |
(Density) | kg/dm3 | >3.14 | |
(Ka ʻike ʻia o ka porosity) | Vo1% | <0.5 | |
(Vickers paakiki) | HV 0.5 | GPa | 28 |
*() Ka ikaika wiliwili* (ʻekolu helu) | 20ºC | MPa | 450 |
(Ka ikaika compressive) | 20ºC | MPa | 3900 |
(Elastic Modulus) | 20ºC | GPa | 420 |
(Oolea ha'iha'i) | MPa/m'% | 3.5 | |
(Hana wela) | 20°ºC | W/(m*K) | 160 |
(Ke kū'ē) | 20°ºC | ʻŌm.cm | 106-108 |
(Koefficient hoʻonui wela) | a(RT**...80ºC) | K-1*10-6 | 4.3 |
(Ka wela hana kiʻekiʻe loa) | oºC | 1700 |
Silicon carbide ceramic tube parameter:
Nā mea | Papa kuhikuhi |
α-SIC | 99% min |
ʻIke ʻia ka Porosity | 16% ka nui |
ʻAiʻi Nui | 2.7g/cm3 min |
Kulou ikaika ma ka wela kiekie | 100 Mpa min |
Coefficient o ka hoonui wela | K-1 4.7x10 -6 |
Coefficient of Thermal Conductivity(1400ºC) | 24 W/mk |
Max. Ka Mahana Hana | 1650ºC |
Nā noi nui:
1. Silicon carbide seramika pā
- ʻOki ʻoki a me ka poli Wafer: lawelawe ma ke ʻano he paepae e hōʻoia i ka pololei kiʻekiʻe a me ka paʻa i ka wā o ka ʻoki a me ka polishing.
- Kaʻina hana Lithography: Hoʻopaʻa ʻia ka wafer i ka mīkini lithography e hōʻoia i ke kūlana kiʻekiʻe i ka wā o ka ʻike.
- Chemical Mechanical Polishing (CMP): hana ma ke ʻano he kahua kākoʻo no ka polishing pads, e hāʻawi ana i ke kaomi like ʻole a me ka hāʻawi ʻana i ka wela.
2. ʻO ka pahu silika carbide
- ʻO ka umu ahi wela kiʻekiʻe: hoʻohana ʻia no nā mea wela kiʻekiʻe e like me ka diffusion furnace a me ka oxidation furnace e lawe i nā wafers no ka mālama ʻana i ke kaʻina hana wela.
- Ke kaʻina hana CVD/PVD: Ma ke ʻano he paipu lawe i loko o ke keʻena pane, kū i nā wela kiʻekiʻe a me nā kinoea corrosive.
- Nā lako lako Semiconductor: no nā mea hoʻololi wela, nā paipu kinoea, a me nā mea ʻē aʻe, e hoʻomaikaʻi i ka hoʻokele wela o nā lako.
Hāʻawi ʻo XKH i kahi ʻano lawelawe maʻamau no nā pā seramika silicon carbide, nā kīʻaha suction a me nā paipu ceramic silicon carbide. Silicon carbide ceramic trays a me nā kīʻaha suction, XKH hiki ke hoʻopilikino ʻia e like me nā koi o ka mea kūʻai aku o nā ʻano nui like ʻole, nā ʻano a me ka ʻili o ka ʻili, a kākoʻo i ka mālama ʻana i ka uhi kūikawā, hoʻomaikaʻi i ke kūpaʻa a me ka pale ʻana i ka corrosion; No nā paipu seramika silicon carbide, hiki i ka XKH ke hana i nā ʻano like ʻole o ke anawaena o loko, ke anawaena o waho, ka lōʻihi a me ke ʻano paʻakikī (e like me ke ʻano o ka tube a i ʻole ka porous tube), a hāʻawi i ka polishing, anti-oxidation coating a me nā kaʻina hana lapaʻau ʻē aʻe. Hōʻoia ka XKH e hiki i nā mea kūʻai ke hoʻohana piha i nā pono hana o nā huahana silicon carbide ceramic e hoʻokō i nā koi koi o nā māla hana kiʻekiʻe e like me semiconductors, led a me photovoltaics.
Kiʻi kikoʻī



