Silicon carbide daimana mīkini ʻoki uea 4/6/8/12 ʻīniha SiC ingot hana
Ke kumu hana:
1. Hoʻoponopono Ingot: Hoʻopaʻa ʻia ʻo SiC ingot (4H / 6H-SiC) ma ke kahua ʻoki ma o ka mea hoʻopili e hōʻoia i ka pololei o ke kūlana (± 0.02mm).
2. Diamond laina neʻe: daimana laina (electroplated daimana particles ma luna o ka ili) ua alakai ia e ke alakai huila nenoaiu no kiʻekiʻe-wikiwiki kaapuni (laina laina 10 ~ 30m / s).
3. ʻOki ʻana i ka meaʻai: hānai ʻia ka ingot ma ke ala i hoʻonohonoho ʻia, a ʻoki ʻia ka laina daimana i ka manawa like me nā laina like like (100 ~ 500 laina) e hana i nā wafers he nui.
4. ʻO ka hoʻomaʻamaʻa a me ka wehe ʻana i ka puʻupuʻu: E pīpī i ka mea hoʻoheheʻe (wai deionized + additives) i ka ʻoki ʻoki e hōʻemi i ka pōʻino wela a wehe i nā ʻāpana.
Nā ʻāpana kī:
1. ʻO ka wikiwiki o kaʻokiʻana: 0.2 ~ 1.0mm / min (e pili ana i ke kuhikuhi aniani a me ka mānoanoa o SiC).
2. Hoʻopaʻapaʻa laina: 20 ~ 50N (kiʻekiʻe maʻalahi e wāwahi i ka laina, haʻahaʻa haʻahaʻa e pili ana i ka ʻoki pololei).
3.Wafer mānoanoa: maʻamau 350 ~ 500μm, wafer hiki i 100μm.
Nā hiʻohiʻona nui:
(1) Oki pololei
ʻO ka ʻae ʻana i ka mānoanoa: ± 5μm (@350μm wafer), ʻoi aku ka maikaʻi ma mua o ka ʻoki ʻana i ka mortar maʻamau (± 20μm).
ʻO ka ʻili o ka ʻili: Ra<0.5μm (ʻaʻohe mea wili hou i koi ʻia e hōʻemi i ka nui o ka hana ma hope).
Warpage: <10μm (e ho'ēmi i ka paʻakikī o ka polishing hope).
(2) Ka hana pono
ʻOki laina nui: ʻokiʻoki i nā ʻāpana 100 ~ 500 i ka manawa, hoʻonui i ka mana hana 3 ~ 5 mau manawa (vs. Hoʻokahi laina laina).
Ke ola laina: Hiki i ka laina daimana ke ʻoki i ka 100 ~ 300km SiC (e pili ana i ka paʻakikī o ka ingot a me ka hoʻomaikaʻi ʻana i ke kaʻina hana).
(3) Ka hana poino haahaa
ʻO ka haki ʻana: <15μm (ʻoki kuʻuna> 50μm), hoʻomaikaʻi i ka hua wafer.
Papa poino o lalo: <5μm (e ho'ēmi i ka wehe ʻana i ka polishing).
(4) Ka palekana a me ka hoʻokele waiwai
ʻAʻole hoʻohaumia ʻia: Hoʻemi ʻia nā kumukūʻai hoʻolei wai ʻōpala i hoʻohālikelike ʻia me ka ʻoki ʻana i ka mortar.
Hoʻohana waiwai: ʻOki ʻana i ka poho <100μm/ ʻokiʻoki, mālama i nā mea maka SiC.
hopena ʻoki:
1. ʻO ka maikaʻi o ka wafer: ʻaʻohe māwae macroscopic ma luna o ka ʻili, liʻiliʻi nā hemahema microscopic (hoʻonui dislocation hiki ke hoʻomalu). Hiki ke hoʻokomo pololei i ka loulou polishing rough, hoʻopōkole i ke kahe kaʻina.
2. Kūlike: ka mānoanoa deviation o ka wafer i loko o ka pūʻulu mea <± 3%, kūpono no ka automated hana.
3.Applicability: Kākoʻo 4H / 6H-SiC ingot ʻokiʻoki, kūpono me ke ʻano conductive / semi-insulated.
ʻIkepili ʻenehana:
Hōʻike | Nā kikoʻī |
Nā Ana (L × W × H) | 2500x2300x2500 a hoʻopilikino paha |
Hoʻoponopono i ka nui o nā mea | 4, 6, 8, 10, 12 'īniha o ka silikon carbide |
ʻOka ʻilikai | Ra≤0.3u |
Awelika ʻoki māmā | 0.3mm/min |
Kaumaha | 5.5t |
Kaʻina hana ʻoki ʻana i nā ʻanuʻu | ≤30 ʻanuʻu |
Ka halulu lako | ≤80 dB |
Uea hao hao | 0~110N(0.25 uea hoʻopaʻapaʻa he 45N) |
ʻO ka wikiwiki uea kila | 0~30m/S |
Mana piha | 50kw |
Anawaena uwea daimana | ≥0.18mm |
Hoʻopau palahalaha | ≤0.05mm |
Ka ʻoki a me ka haki ʻana | ≤1% (koe wale no nā kumu kanaka, mea silika, laina, mālama a me nā kumu ʻē aʻe) |
Nā lawelawe XKH:
Hāʻawi ʻo XKH i ke kaʻina hana holoʻokoʻa o ka mīkini ʻoki wili daimana silicon carbide, me ke koho ʻana i nā mea hana (wire diameter/wire speed matching), ka hoʻomohala ʻana (ʻoki ʻana i ka parameter optimization), nā lako mea kūʻai (diamond wire, alakaʻi huila) a me ke kākoʻo ma hope o ke kūʻai ʻana (mālama ʻana i nā lako, ʻoki ʻoki ʻana i ka maikaʻi) Hāʻawi pū ia i nā hoʻomaikaʻi maʻamau (e like me ka ʻokiʻoki ultra-thin, ka hoʻouka ʻana a me ka wehe ʻana) me kahi manawa alakaʻi he 4-8 pule.
Kiʻi kikoʻī


