ʻO ka paipu umu pālahalaha Silicon Carbide (SiC)

Kiʻi i hōʻike ʻia no ka paipu umu pālahalaha Silicon Carbide (SiC)

Wehewehe Pōkole:

ʻO ka Silicon Carbide (SiC) Horizontal Furnace Tube e lawelawe ana ma ke ʻano he keʻena hana nui a me ka palena kaomi no nā hopena kinoea wela kiʻekiʻe a me nā hana wela i hoʻohana ʻia i ka hana semiconductor, ka hana photovoltaic, a me ka hana ʻana i nā mea holomua.

E leka uila mai iā mākou

Nā hiʻohiʻona

Kiʻikuhi kikoʻī

Ke Kūlana Huahana a me ka Manaʻo Waiwai

Hana ʻia me kahi ʻāpana SiC hoʻokahi i hana ʻia me ka hoʻohui i hui pū ʻia me kahi papa pale CVD-SiC mānoanoa, hāʻawi kēia paipu i ka conductivity thermal kūikawā, ka haumia liʻiliʻi, ka kūpaʻa mechanical ikaika, a me ke kūpaʻa kemika koʻikoʻi.
Hoʻomaopopo kona hoʻolālā i ka like ʻana o ka mahana, nā wā lawelawe lōʻihi, a me ka hana paʻa no ka wā lōʻihi.

Nā Pōmaikaʻi Koʻikoʻi

Hoʻonui i ke kūlike o ka mahana o ka ʻōnaehana, ka maʻemaʻe, a me ka pono holoʻokoʻa o nā lako (OEE).
Hoʻemi i ka manawa hana ʻole no ka hoʻomaʻemaʻe ʻana a hoʻolōʻihi i nā pōʻaiapuni pani, e hoʻohaʻahaʻa ana i ka huina kumukūʻai o ka loaʻa ʻana (TCO).
Hāʻawi i kahi keʻena lōʻihi e hiki ai ke lawelawe i nā kemika oxidative wela kiʻekiʻe a me nā kemika waiwai i ka chlorine me ka liʻiliʻi o ka pilikia.

Nā Lewa Pili a me ka Puka Manaʻo Hana

Nā kinoea paneʻo ka oxygen (O₂) a me nā hui oxidizing ʻē aʻe
Nā kinoea lawe/pale: naikokene (N₂) a me nā kinoea inert maʻemaʻe loa
Nā ʻano kūpononā kinoea e halihali ana i ka chlorine (ka nui o ka hoʻohuihui a me ka manawa noho i kāohi ʻia e ke kuhikuhi)

Nā Kaʻina Hana MaʻamauʻO nā hana like ʻole: ka hoʻomake ʻana maloʻo/pulu, ka hoʻoheheʻe ʻana, ka hoʻolaha ʻana, ka waiho ʻana o LPCVD/CVD, ka hoʻāla ʻana i ka ʻili, ka passivation photovoltaic, ka ulu ʻana o ka ʻili lahilahi hana, ka carbonization, ka nitridation, a me nā mea hou aku.

Nā Kūlana Hana

Mahana: mahana o ka lumi a hiki i 1250 °C (e ʻae i ka palena palekana 10-15% ma muli o ka hoʻolālā mea hoʻomehana a me ΔT)
Kaomi: mai nā pae vacuum haʻahaʻa/LPCVD a hiki i ke kaomi maikaʻi kokoke i ka lewa (kikoʻī hope loa no kēlā me kēia kauoha kūʻai)

Nā Mea Hana a me ke Kumu Hoʻonohonoho

Kino SiC Monolithic (Hana ʻia ka mea hoʻohui)

ʻO ka β-SiC kiʻekiʻe a i ʻole ka SiC multiphase, i kūkulu ʻia ma ke ʻano he ʻāpana hoʻokahi—ʻaʻohe hui a i ʻole nā humuhumu i hoʻopaʻa ʻia e hiki ke liki a hana paha i nā kiko koʻikoʻi.
ʻO ka conductivity thermal kiʻekiʻe e hiki ai i ka pane wela wikiwiki a me ke ʻano like o ka mahana axial/radial maikaʻi loa.
ʻO ke koina haʻahaʻa a paʻa o ka hoʻonui wela (CTE) e hōʻoiaʻiʻo i ke kūpaʻa o ka dimensional a me nā sila hilinaʻi i nā mahana kiʻekiʻe.

Uhi Hana CVD SiC

I waiho ʻia ma kahi, ultra-pure (nā mea haumia o ka ʻili/uhi < 5 ppm) e kāohi i ka hana ʻana o nā ʻāpana a me ka hoʻokuʻu ʻana o nā ion metala.
ʻO ka inertness kemika maikaʻi loa e kūʻē i nā kinoea oxidizing a me ka chlorine, e pale ana i ka hoʻouka ʻana o ka paia a i ʻole ka waiho hou ʻana.
Nā koho mānoanoa kikoʻī no ka ʻāpana e kaulike i ke kūpaʻa ʻana i ka pala a me ka pane ʻana i ka wela.

Pōmaikaʻi i hui pū ʻiaʻO ke kino SiC paʻa e hāʻawi i ka ikaika kūkulu a me ka hoʻoili wela, ʻoiai ʻo ka papa CVD e hōʻoiaʻiʻo i ka maʻemaʻe a me ke kūpaʻa i ka pala no ka hilinaʻi nui loa a me ka throughput.

Nā Pahuhopu Hana Koʻikoʻi

Ka mahana hoʻohana mau:≤ 1250 °C
Nā haumia o ka substrate nui:< 300 ppm
Nā haumia o ka ʻili CVD-SiC:< 5 ppm
Nā hoʻomanawanui ana: OD ±0.3–0.5 mm; coaxiality ≤ 0.3 mm/m (loaʻa nā mea paʻa)
ʻO ka ʻoʻoleʻa o loko o ka paia: Ra ≤ 0.8–1.6 µm (koho ʻia ka hoʻopau ʻana i hoʻopili ʻia a kokoke i ke aniani)
Ka helu o ka hoʻokahe ʻana o ka helium: ≤ 1 × 10⁻⁹ Pa·m³/s
Ke ahonui wela-haʻalulu: ola i ka holo kaʻa wela/anu pinepine me ka ʻole o ka haki a i ʻole ka spallation
ʻAhahui lumi maʻemaʻe: Papa ISO 5–6 me nā pae koena ʻāpana/metala-ion i hōʻoia ʻia

Nā Hoʻonohonoho a me nā Koho

Anahonua: OD 50–400 mm (ʻoi aku ka nui ma o ka loiloi) me ke kūkulu lōʻihi hoʻokahi ʻāpana; ua hoʻonohonoho pono ʻia ka mānoanoa o ka paia no ka ikaika mechanical, ke kaumaha, a me ke kahe wela.
Nā hoʻolālā hopenanā flanges, ka waha bele, ka bayonet, nā apo hoʻonoho, nā ʻauwaha O-ring, a me nā puka pamu-out a i ʻole nā puka kaomi maʻamau.
Nā awa hananā kahe ʻana o ka thermocouple, nā noho aniani ʻike, nā puka komo kinoea bypass—ua hana ʻia nā mea a pau no ka hana wela kiʻekiʻe, paʻa ka leaka.
Nā hoʻolālā uhi: paia o loko (paʻamau), paia o waho, a i ʻole ka uhi piha; pale i kuhikuhi ʻia a i ʻole ka mānoanoa i hoʻonohonoho ʻia no nā wahi i hoʻopilikia nui ʻia.
Ka mālama ʻana i ka ʻili a me ka hoʻomaʻemaʻenā ʻano ʻoʻoleʻa he nui, ka hoʻomaʻemaʻe ultrasonic/DI, a me nā kaʻina hana bake/dry maʻamau.
Nā mea komonā flanges graphite/ceramic/metala, nā sila, nā mea e hoʻonoho ai, nā lima lawelawe, a me nā wahi mālama.

Hoʻohālikelike Hana

Metrika	ʻO ka paipu SiC	Paipu Quartz	ʻO ka paipu Alumina	ʻO ka paipu graphite
Ka hoʻokele wela	Kiʻekiʻe, ʻano like	Haʻahaʻa	Haʻahaʻa	Kiʻekiʻe
Ikaika/kolohe wela kiʻekiʻe	Maikaʻi loa	Kūpono	Maikaʻi loa	Maikaʻi (mālama ʻia i ka oxidation)
Haʻalulu wela	Maikaʻi loa	Nāwaliwali	Waena	Maikaʻi loa
Ka maʻemaʻe / nā ʻiona metala	Maikaʻi loa (haʻahaʻa)	Waena	Waena	ʻilihune
ʻOkika a me ke kemika Cl	Maikaʻi loa	Kūpono	Maikaʻi loa	ʻilihune (oxidizes)
Kumukūʻai vs. ke ola lawelawe	Ola waena / lōʻihi	Haʻahaʻa / pōkole	Waena / waena	Waena / palena ʻia e ke kaiapuni

Nā Nīnau i Nīnau Pinepine ʻia (FAQ)

Q1. No ke aha e koho ai i kahi kino SiC monolithic i paʻi ʻia he 3D?
A. Hoʻopau ia i nā humuhumu a me nā pale e hiki ke hoʻokahe a hoʻopaʻa paha i ke kaumaha, a kākoʻo i nā geometries paʻakikī me ka pololei kūlike o ka dimensional.

Q2. Kūleʻa anei ʻo SiC i nā kinoea e lawe ana i ka chlorine?
ʻAe. He paʻa loa ka CVD-SiC i loko o nā palena mahana a me ke kaomi i kuhikuhi ʻia. No nā wahi hopena kiʻekiʻe, ua ʻōlelo ʻia nā uhi mānoanoa kūloko a me nā ʻōnaehana purge/exhaust ikaika.

Q3. Pehea e ʻoi aku ai ka maikaʻi o nā paipu quartz?
Hāʻawi ʻo A. SiC i ke ola lawelawe lōʻihi, ʻoi aku ka like o ka mahana, haʻahaʻa ka haumia o nā ʻāpana/metal-ion, a me ka hoʻomaikaʻi ʻana i ka TCO—ʻoi aku hoʻi ma mua o ~900 °C a i ʻole i nā lewa oxidizing/chlorinated.

Q4. Hiki i ka paipu ke hoʻokele i ka piʻi wikiwiki ʻana o ka wela?
ʻAe, inā mālama ʻia ka ΔT kiʻekiʻe loa a me nā alakaʻi ramp-rate. ʻO ka hoʻopili ʻana i kahi kino SiC kiʻekiʻe-κ me kahi papa CVD lahilahi e kākoʻo i nā hoʻololi wela wikiwiki.

Q5. Āhea e pono ai ka hoʻololi?
A. E hoʻihoʻi i ka paipu inā ʻike ʻoe i nā māwae flange a i ʻole ka lihi, nā lua uhi a i ʻole ka spallation, ka hoʻonui ʻana i nā helu leaka, ka haʻalele nui ʻana o ka ʻaoʻao mahana, a i ʻole ka hana ʻāpana ʻē.

E pili ana iā mākou

He loea ʻo XKH i ka hoʻomohala ʻenehana kiʻekiʻe, ka hana ʻana, a me ke kūʻai aku ʻana i ke aniani optical kūikawā a me nā mea kristal hou. Lawelawe kā mākou huahana i nā mea uila optical, nā mea uila mea kūʻai aku, a me ka pūʻali koa. Hāʻawi mākou i nā ʻāpana optical Sapphire, nā uhi lens kelepona paʻalima, Ceramics, LT, Silicon Carbide SIC, Quartz, a me nā wafers kristal semiconductor. Me ka ʻike loea a me nā lako hana kiʻekiʻe, ʻoi aku mākou i ka hana ʻana i nā huahana maʻamau ʻole, me ka manaʻo e lilo i alakaʻi i nā mea optoelectronic ʻoihana ʻenehana kiʻekiʻe.