Waʻa Wafer Silicon Carbide (SiC)

Wehewehe Pōkole:

ʻO ka waʻa wafer Silicon Carbide (SiC) he mea lawe kaʻina hana semiconductor i hana ʻia me ka mea SiC maʻemaʻe kiʻekiʻe, i hoʻolālā ʻia e paʻa a lawe i nā wafers i ka wā o nā kaʻina hana wela kiʻekiʻe koʻikoʻi e like me ka epitaxy, oxidation, diffusion, a me annealing.


Nā hiʻohiʻona

Kiʻikuhi kikoʻī

1_副本
2_副本

ʻIkepili o ke Aniani Quartz

ʻO ka waʻa wafer Silicon Carbide (SiC) he mea lawe kaʻina hana semiconductor i hana ʻia me ka mea SiC maʻemaʻe kiʻekiʻe, i hoʻolālā ʻia e paʻa a lawe i nā wafers i ka wā o nā kaʻina hana wela kiʻekiʻe koʻikoʻi e like me ka epitaxy, oxidation, diffusion, a me annealing.

Me ka wikiwiki o ka hoʻomohala ʻana o nā semiconductors mana a me nā mea hana bandgap ākea, ke kū nei nā waʻa quartz maʻamau i nā palena e like me ke ʻano ʻino i nā mahana kiʻekiʻe, ka haumia nui o nā ʻāpana, a me ke ola lawelawe pōkole. ʻO nā waʻa wafer SiC, e hōʻike ana i ke kūpaʻa wela kiʻekiʻe, ka haumia haʻahaʻa, a me ke ola lōʻihi, ke pani nei i nā waʻa quartz a lilo i koho makemake ʻia i ka hana ʻana i nā mea hana SiC.

Nā Hiʻohiʻona Koʻikoʻi

1. Nā Pōmaikaʻi Mea

  • Hana ʻia mai ka SiC maʻemaʻe kiʻekiʻe mepaʻakikī kiʻekiʻe a me ka ikaika.

  • ʻO ke kiko heheʻe ma luna o 2700°C, ʻoi aku ke kiʻekiʻe ma mua o ka quartz, e hōʻoiaʻiʻo ana i ka paʻa lōʻihi ma nā wahi koʻikoʻi.

2. Nā Waiwai Wela

  • ʻO ke alakaʻi wela kiʻekiʻe no ka hoʻoili wela wikiwiki a like, e hoʻemi ana i ke kaumaha wafer.

  • Hoʻohālikelike pono ke koina hoʻonui wela (CTE) i nā substrates SiC, e hōʻemi ana i ke kulou ʻana o ka wafer a me ka nahā ʻana.

3. Paʻa Kemika

  • Paʻa ma lalo o ke ana wela kiʻekiʻe a me nā lewa like ʻole (H₂, N₂, Ar, NH₃, a pēlā aku).

  • ʻO ke kūpaʻa oxidation maikaʻi loa, e pale ana i ka decomposition a me ka hanauna ʻāpana.

4. Hana Hana

  • ʻO ka ʻili laumania a mānoanoa e hōʻemi i ka hoʻokahe ʻana o nā ʻāpana a me ka haumia.

  • Mālama i ke kūpaʻa o ka nui a me ka hiki ke ukana ma hope o ka hoʻohana lōʻihi.

5. Ka Pono o ke Kumukūʻai

  • ʻOi aku ka lōʻihi o ke ola lawelawe ma mua o nā waʻa quartz 3-5 mau manawa.

  • Hoʻemi ʻia ka alapine mālama haʻahaʻa, e hōʻemi ana i ka downtime a me nā kumukūʻai hoʻololi.

Nā noi

  • ʻO ka Epitaxy SiCKe kākoʻo nei i nā substrates SiC 4-'īniha, 6-'īniha, a me 8-'īniha i ka wā o ka ulu ʻana o ka epitaxial wela kiʻekiʻe.

  • Hana Hana ManaKūpono no nā SiC MOSFET, Schottky Barrier Diodes (SBD), IGBT, a me nā mea hana ʻē aʻe.

  • Ka Hana WelaNā kaʻina hana hoʻoheheʻe ʻana, nitridation, a me ke kalapona.

  • ʻOkika a me ka Hoʻolaha: Kahua kākoʻo wafer paʻa no ka hoʻokeʻokeʻo ʻana a me ka hoʻolaha ʻana i ka mahana kiʻekiʻe.

Nā Kikoʻī ʻenehana

Mea Nā kikoʻī
Mea Hana ʻO ka Silicon Carbide maʻemaʻe kiʻekiʻe (SiC)
Ka nui o ka Wafer 4-'īniha / 6-'īniha / 8-'īniha (hiki ke hoʻopilikino ʻia)
Ka Mahana Hana Loa. ≤ 1800°C
Hoʻonui Wela CTE 4.2 × 10⁻⁶ /K (kokoke i ka substrate SiC)
Ka Hoʻokele Wela 120–200 W/m·K
ʻO ka ʻōʻili Ra < 0.2 μm
Parallelism ±0.1 mm
Ola lawelawe ≥ 3 × ʻoi aku ka lōʻihi ma mua o nā waʻa quartz

 

Hoʻohālikelike: Waʻa Quartz vs. Waʻa SiC

Ana Waʻa Quartz Waʻa SiC
Ke kū'ē ʻana i ka mahana ≤ 1200°C, hoʻololi ʻia ke ʻano ma ke ana wela kiʻekiʻe. ≤ 1800°C, kūpaʻa ka wela
Hoʻohālikelike CTE me SiC Nui ka mismatch, ka pilikia o ke kaumaha wafer Hoʻohālikelike kokoke, hōʻemi i ka haki ʻana o ka wafer
Ka haumia ʻana o nā ʻāpana Kiʻekiʻe, hoʻopuka i nā mea haumia ʻIli haʻahaʻa, laumania a mānoanoa
Ola lawelawe Hoʻololi pōkole, pinepine Lōʻihi, 3–5× lōʻihi ke ola
Kaʻina Hana Kūpono ʻO ka epitaxy Si maʻamau Hoʻonohonoho ʻia no nā SiC epitaxy a me nā polokalamu mana

 

Nā nīnau i nīnau pinepine ʻia - Nā waʻa wafer Silicon Carbide (SiC)

1. He aha ka waʻa wafer SiC?

ʻO ka waʻa wafer SiC kahi mea lawe kaʻina hana semiconductor i hana ʻia me ka silicon carbide maʻemaʻe kiʻekiʻe. Hoʻohana ʻia ia e paʻa a lawe i nā wafers i ka wā o nā kaʻina hana wela kiʻekiʻe e like me ka epitaxy, oxidation, diffusion, a me ka annealing. Ke hoʻohālikelike ʻia me nā waʻa quartz kuʻuna, hāʻawi nā waʻa wafer SiC i ke kūpaʻa wela kiʻekiʻe, ka haumia haʻahaʻa, a me ke ola lawelawe lōʻihi.


2. No ke aha e koho ai i nā waʻa wafer SiC ma mua o nā waʻa quartz?

  • Ke kū'ē wela kiʻekiʻePaʻa a hiki i 1800°C vs. quartz (≤1200°C).

  • Hoʻokūkū CTE maikaʻi aʻeKokoke i nā substrates SiC, e hoʻemi ana i ke koʻikoʻi wafer a me ka nahā ʻana.

  • Ka hanauna ʻāpana haʻahaʻaʻO ka ʻili laumania a mānoanoa e hōʻemi ana i ka haumia.

  • ʻOi aku ka lōʻihi o ke ola: 3–5 mau manawa ʻoi aku ka lōʻihi ma mua o nā waʻa quartz, e hoʻemi ana i ke kumukūʻai o ka loaʻa ʻana.


3. He aha nā nui wafer e hiki i nā waʻa wafer SiC ke kākoʻo?

Hāʻawi mākou i nā hoʻolālā maʻamau no4-'īniha, 6-'īniha, a me 8-'īnihanā wafers, me ka hoʻopilikino piha i loaʻa e hoʻokō i nā pono o nā mea kūʻai aku.


4. Ma nā kaʻina hana hea e hoʻohana pinepine ʻia ai nā waʻa wafer SiC?

  • Ka ulu ʻana o ka epitaxial SiC

  • Hana ʻana i nā hāmeʻa semiconductor mana (SiC MOSFETs, SBDs, IGBTs)

  • ʻO ka hoʻomehana wela kiʻekiʻe, ka nitridation, a me ke kalapona

  • Nā kaʻina hana oxidation a me ka diffusion

E pili ana iā mākou

He loea ʻo XKH i ka hoʻomohala ʻenehana kiʻekiʻe, ka hana ʻana, a me ke kūʻai aku ʻana i ke aniani optical kūikawā a me nā mea kristal hou. Lawelawe kā mākou huahana i nā mea uila optical, nā mea uila mea kūʻai aku, a me ka pūʻali koa. Hāʻawi mākou i nā ʻāpana optical Sapphire, nā uhi lens kelepona paʻalima, Ceramics, LT, Silicon Carbide SIC, Quartz, a me nā wafers kristal semiconductor. Me ka ʻike loea a me nā lako hana kiʻekiʻe, ʻoi aku mākou i ka hana ʻana i nā huahana maʻamau ʻole, me ka manaʻo e lilo i alakaʻi i nā mea optoelectronic ʻoihana ʻenehana kiʻekiʻe.

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