4H-semi HPSI 2 inihi SiC substrate wafer Production Dummy Research māka
Semi-insulating silikon carbide substrate SiC wafers
Hoʻokaʻawale nui ʻia ka substrate silicon carbide i loko o ke ʻano conductive a me semi-insulating, conductive silicon carbide substrate i n-type substrate i hoʻohana nui ʻia no ka epitaxial GaN-based LED a me nā mea ʻē aʻe optoelectronic, SiC-based power electronic device, etc., a me semi- Hoʻohana nui ʻia ka insulating SiC silicon carbide substrate no ka hana epitaxial o GaN kiʻekiʻe kiʻekiʻe kiʻekiʻe kiʻekiʻe lekiō uila alapine. Eia kekahi kiʻekiʻe-maʻemaʻe semi-insulation HPSI a me SI semi-insulation mea okoa, kiʻekiʻe-maʻemaʻe kiʻekiʻe semi-insulation kaʻa kaʻa o 3.5 * 1013 ~ 8 * 1015/cm3 laulā, me ka kiʻekiʻe electron mobility; ʻO ka semi-insulation kahi mea kūʻē kiʻekiʻe, kiʻekiʻe loa ka resistivity, hoʻohana maʻamau no nā substrates mīkini microwave, non-conductive.
Semi-insulating Silicon Carbide substrate sheet SiC wafer
Hoʻoholo ka hoʻolālā aniani SiC i kona kino, pili iā Si a me GaAs, loaʻa iā SiC no nā waiwai kino; ʻO ka laulā o ka pahu kapu he nui, kokoke i 3 mau manawa o ka Si, e hōʻoia i ka hana o ka mea hana i nā mahana kiʻekiʻe ma lalo o ka hilinaʻi lōʻihi; He kiʻekiʻe ka ikaika o ke kahua breakdown, he 1O mau manawa o Si, e hōʻoia i ka mana o ka uila uila, e hoʻomaikaʻi i ka waiwai o ka uila; He nui ka helu electron saturation, he 2 manawa ia o ka Si, e hoʻonui i ke alapine o ka mea hana a me ka nui o ka mana; ʻOi aku ka nui o ka conductivity thermal, ʻoi aku ma mua o Si, kiʻekiʻe ka conductivity thermal, kiʻekiʻe ka conductivity thermal, kiʻekiʻe ka conductivity thermal, kiʻekiʻe ka conductivity thermal, ʻoi aku ka nui ma mua o ka Si, kiʻekiʻe ka conductivity thermal, kiʻekiʻe ka conductivity thermal. ʻO ka conductivity thermal kiʻekiʻe, ʻoi aku ma mua o 3 mau manawa o Si, e hoʻonui ana i ka hiki ke hoʻoheheʻe wela o ka hāmeʻa a ʻike i ka miniaturization o ka mea.