BF33 Glass Wafer Advanced Borosilicate Substrate 2″4″6″8″12″

ʻO ka wehewehe pōkole:

ʻO ka wafer aniani BF33, i ʻike ʻia ma ke ao holoʻokoʻa ma lalo o ka inoa kālepa ʻo BOROFLOAT 33, he aniani borosilicate float kiʻekiʻe i hana ʻia e SCHOTT me ka hoʻohana ʻana i ke ʻano hana microfloat kūikawā. Hāʻawi kēia kaʻina hana i nā ʻāpana aniani me ka mānoanoa like ʻole, ka palahalaha o ka ʻili maikaʻi, ka liʻiliʻi micro-roughness, a me ka ʻike maka.

E hoʻouna i ka leka uila iā mākou

Nā hiʻohiʻona

Kiʻi kikoʻī

Nānā o BF33 Glass Wafer

ʻO kahi hiʻohiʻona koʻikoʻi o BF33 ʻo ia kona helu haʻahaʻa o ka hoʻonui wela (CTE) ma kahi o 3.3 × 10.^-6 K^-1, e hoʻohālikelike ana i nā substrate silika. Hāʻawi kēia waiwai i ka hoʻohui ʻana i ke koʻikoʻi i nā microelectronics, MEMS, a me nā mea optoelectronic.

Kiʻekiʻe-Ultra-Thin-Quartz-Wafer-Mānoanoa-0-1mm

Mea Hana o BF33 Glass Wafer

No ka ʻohana aniani borosilicate ka BF33 a ʻoi aku ka nui80% silika (SiO2), me ka boron oxide (B2O3), alkali oxides, a me ka huina o ka alumini oxide. Hāʻawi kēia formulation:

Haʻahaʻa haʻahaʻahoʻohālikelike ʻia me ke aniani soda-lime, e hōʻemi ana i ke kaumaha o nā mea āpau.
Hoʻemi ʻia ka ʻike alkali, e hoemi ana i ka leaching ion i loko o nā ʻōnaehana analytical koʻikoʻi a i ʻole biomedical.
Hoʻonui i ke kū'ēi ka hoʻouka kemika mai nā waikawa, alkalis, a me nā mea hoʻoheheʻe organik.

Kaʻina hana o BF33 Glass Wafer

Hana ʻia nā wafers aniani BF33 ma o ke ʻano o nā ʻanuʻu i hoʻokele pololei ʻia. ʻO ka mea mua, ʻoi aku ka maʻemaʻe kiʻekiʻe o ka silica, boron oxide, a me ka trace alkali a me nā alumini oxides-ua kaupaona ʻia a hui pū ʻia. Hoʻoheheʻe ʻia ka pūʻulu i nā wela kiʻekiʻe a hoʻomaʻemaʻe ʻia e hoʻopau i nā ʻōpū a me nā haumia. Ke hoʻohana nei i ke kaʻina hana microfloat, kahe ka aniani hoʻoheheʻe ʻia ma luna o ka ipu i hoʻoheheʻe ʻia e hana i nā lau palahalaha loa. Hoʻopili mālie ʻia kēia mau lau e hoʻopau i ke kaumaha o loko, a laila ʻoki ʻia i loko o nā papa ʻehā a hoʻopaʻa ʻia i loko o nā wafers poepoe. Hoʻopili ʻia nā ʻaoʻao wafer a i ʻole chamfered no ka lōʻihi, a ukali ʻia e ka lapping pololei a me ka poli ʻaoʻao ʻelua e hoʻokō ai i nā ʻaoʻao ultra-smooth. Ma hope o ka hoʻomaʻemaʻe kani ultrasonic i loko o kahi lumi hoʻomaʻemaʻe, hoʻomaʻamaʻa ʻia kēlā me kēia wafer no ka nui, ka palahalaha, ka maikaʻi optical, a me nā hemahema o ka ʻili. ʻO ka mea hope loa, hoʻopili ʻia nā wafers i loko o nā ipu lepo ʻole e hōʻoia i ka paʻa ʻana o ka maikaʻi a hiki i ka hoʻohana ʻana.

Nā Pono Mechanical o BF33 Glass Wafer

Huahana	BORFLOAT 33
ʻO ka mānoanoa	2.23 g/cm3
Modulus o Elasticity	63 kN/mm2
Knoop Hardness HK 0.1/20	480
Ka ratio o Poisson	0.2
Dielectric mau (@ 1 MHz & 25°C)	4.6
Nani Pohō (@ 1 MHz & 25°C)	37 x 10-4
Ka ikaika dielectric(@ 50 Hz & 25°C)	16 kV/mm
Hōʻike Hōʻike	1.472
Hoʻopuehu (nF - nC)	71.9 x 10-4

FAQ o BF33 Glass Wafer

He aha ke aniani BF33?

ʻO BF33, i kapa ʻia hoʻi ʻo BOROFLOAT® 33, he aniani borosilicate float premium i hana ʻia e SCHOTT me ka hoʻohana ʻana i kahi kaʻina microfloat. Hāʻawi ia i ka hoʻonui wela haʻahaʻa (~ 3.3 × 10⁻⁶ K⁻¹), ʻoi aku ka maikaʻi o ka pale ʻana i ka haʻalulu wela, ka mālamalama optical kiʻekiʻe, a me ka lōʻihi kemika.

Pehea ka ʻokoʻa o BF33 me ke aniani maʻamau?

Hoʻohālikelike ʻia me ke aniani soda-lime, BF33:

Loaʻa ka helu haʻahaʻa haʻahaʻa o ka hoʻonui wela, e hōʻemi ana i ke koʻikoʻi mai nā loli wela.
ʻOi aku ka pale kemika i nā waikawa, alkalis, a me nā mea hoʻoheheʻe.
Hāʻawi i ka hoʻoili UV a me IR kiʻekiʻe.
Hāʻawi i ka ikaika mechanical ʻoi aku ka maikaʻi a me ka pale ʻana.

No ke aha i hoʻohana ʻia ai ka BF33 i nā noi semiconductor a me MEMS?

ʻO kona hoʻonui wela e pili pono ana i ke silika, e kūpono ana ia no ka hoʻopaʻa anodic a me ka microfabrication. Hiki i kona mau kemika ke hoʻomanawanui i ka etching, ka hoʻomaʻemaʻe, a me nā kaʻina hana wela kiʻekiʻe me ka ʻole o ka hōʻino.

Hiki iā BF33 ke pale i nā wela kiʻekiʻe?

Hoʻohana mau: a hiki i ~450 °C
Hōʻike manawa pōkole (≤ 10 hola): a hiki i ~500 °C
Hāʻawi ka CTE haʻahaʻa iā ia i ke kūpaʻa maikaʻi i nā loli wela wikiwiki.

E pili ana iā mākou

Hoʻokumu ʻo XKH i ka hoʻomohala ʻenehana kiʻekiʻe, ka hana ʻana, a me ke kūʻai ʻana i nā aniani optical kūikawā a me nā mea aniani hou. Hāʻawi kā mākou huahana i nā uila uila, nā mea hoʻohana uila, a me ka pūʻali koa. Hāʻawi mākou i nā ʻāpana optical Sapphire, nā uhi kelepona kelepona paʻa, Ceramics, LT, Silicon Carbide SIC, Quartz, a me nā wafer kristal semiconductor. Me ka ʻike akamai a me nā mea hana ʻoki ʻoki, ʻoi aku mākou i ka hoʻoili huahana maʻamau ʻole, me ka manaʻo e lilo i alakaʻi optoelectronic material high-tech ʻoihana.

Sapphire Wafer Blank Ma'ema'e Ki'eki'e Ma'ema'e Sapphire Substrate No ka Ho'oponopono 'ana 5

Mua: ʻO nā Wafers Quartz Fused High-Purity no Semiconductor, Photonics Optical Applications 2″4″6″8″12″

Aʻe: ʻO JGS1, JGS2, a me JGS3 i hoʻohui ʻia i ke aniani ʻonika silica