KY a me EFG Sapphire Method Paipu koʻokoʻo sapphire paipu kiʻekiʻe
wehewehe
Hoʻohana ʻia ʻo Sapphire Rods ma kahi ākea o nā noi.Hiki ke hana ʻia ke koʻokoʻo sapphire me nā ʻili a pau i hoʻomaʻamaʻa ʻia no ka hoʻohana ʻana i ka ʻike a me ka hoʻohana ʻana a i ʻole me nā ʻili a pau e wili maikaʻi ʻia (ʻaʻole i hoʻoliʻi ʻia) e lilo i insulator.
ʻenehana
I ke kaʻina hana o ka huki ʻana i nā paipu sapphire mai kahi heheʻe me ke kōkua o kahi hua, ʻo ka longitudinal wela gradient ma ka ʻāpana ma waena o ke alo paʻa a me ka ʻāpana o ka huki ʻana ma waena o 1850 a me 1900 deg.Mālama ʻia ʻo C ma mua o 30 deg.C/cm.Hoʻopili ʻia ka paipu i ulu ma kahi mahana ma waena o 1950 a 2000 degere.C ma ka hoʻonui ʻana i ka mahana ma kahi o 30 a 40 deg.C/min a me ka mālama ʻana i ka paipu ma ka mahana i ʻōlelo ʻia i loko o kahi manawa ma waena o 3 a 4 mau hola.Ma hope o kēlā, hoʻomālili ʻia ka paipu i ka lumi wela ma kahi o 30-40 deg.C/min.
Nā noi hana semiconductor
(HPD CVD, PECVD, Dry Etch, Wet Etch).
Paipu hoʻopili plasma.
Kaʻina hana kinoea injector nozzles.
Mea ʻike hope.
Nā Paipu Corona Excimer.
Nā Paipu Paʻa Plasma
ʻO ka mīkini hoʻopaʻa pahu plasma he mea hoʻohana e hoʻopili i nā mea uila.ʻO kāna kumu nui ka hoʻohana ʻana i ka wela kiʻekiʻe a me ke kaomi kiʻekiʻe o ka plasma e hoʻoheheʻe i ka mea hoʻopili a hoʻopaʻa iā ia ma ka ʻāpana.ʻO nā mea nui o ka mīkini hoʻopaʻa ʻana i ka plasma tube ka mea hana plasma, ke keʻena sealing tube, ʻōnaehana vacuum, ʻōnaehana mana, etc.
ʻO ka Sheath Protection Thermocouple (Thermowell)
ʻO ka Thermocouple kahi mea ana wela maʻamau i ka mea ana wela, e ana pololei ia i ka wela, a hoʻololi i ka hōʻailona wela i ka hōʻailona ikaika electromotive thermoelectric, ma o ka mea uila (mea hana lua) i ka mahana o ka mea i ana ʻia.
Hoʻomaʻemaʻe wai / hoʻomaʻemaʻe
Nā Waiwai Sapphire Tube (Theoretical)
| Huihui Hui | Al2O3 |
| Kaumaha Molecular | 101.96 |
| Ka nana aku | Nā paipu translucent |
| Lae hehee | 2050 °C (3720 °F) |
| Lae paila | 2,977° C (5,391° F) |
| ʻO ka mānoanoa | 4.0 g/cm3 |
| Morphology | Trigonal (hex), R3c |
| Solubility i loko o ka H2O | 98 x 10-6 g/100g |
| Hōʻike Hōʻike | 1.8 |
| Kū'ē Uila | 17 10x Ω-m |
| Ka ratio o Poisson | 0.28 |
| Wela Kūikawā | 760 J Kg-1 K-1 (293K) |
| Ikaika U'i | 1390 MPa (Ultimate) |
| ʻO ka hoʻoili wela | 30 W/mK |
| Hoʻonui wela | 5.3 µm/mK |
| Opio Modulus | 450 GPa |
| Misa pololei | 101.948 g/mol |
| Monoisotopic Mass | 101.94782 Da |
Kiʻi kikoʻī
