ʻO HPSI SiC Wafer ≥90% Transmittance Optical Grade no nā aniani AI/AR
Introduction Core: ʻO ke kuleana o nā HPSI SiC Wafers i nā aniani AI/AR
ʻO HPSI (High-Purity Semi-Insulating) Silicon Carbide wafers he mau wafers kūikawā i hōʻike ʻia e ka resistivity kiʻekiʻe (>10⁹ Ω·cm) a me ka haʻahaʻa haʻahaʻa haʻahaʻa. I nā aniani AI / AR, lawelawe nui lākou ma ke ʻano he kumu substrate no nā lens waveguide optical diffractive, e kamaʻilio ana i nā bottlenecks e pili ana me nā mea optical kuʻuna e pili ana i nā ʻano mea lahilahi a me ka māmā, ka wela wela, a me ka hana optical. No ka laʻana, hiki i nā aniani AR e hoʻohana ana i nā lens waveguide SiC ke loaʻa i kahi ākea ākea ākea (FOV) o 70°–80°, ʻoiai e hōʻemi ana i ka mānoanoa o kahi papa lens hoʻokahi i 0.55mm wale nō a me ke kaumaha i 2.7g wale nō, e hoʻomaikaʻi nui ana i ka hoʻohana ʻana i ka hōʻoluʻolu a me ka ʻike ʻana.
Nā ʻano nui: Pehea e hoʻoikaika ai ʻo SiC Material i ka AI/AR Glasses Design
Kiekie Refractive Index a Optical Performance Optimization
- Kokoke 50% ki'eki'e o ka hua'ōlelo refractive o SiC (2.6–2.7) ma mua o ke aniani kahiko (1.8–2.0). ʻAe kēia i nā hale alakaʻi nalu ʻoi aku ka lahilahi a ʻoi aku ka maikaʻi, e hoʻonui nui i ka FOV. ʻO ke kiʻekiʻe refractive index pū kekahi e kōkua i ka hoʻopaʻa ʻana i ka "hopena anuenue" maʻamau i nā alakaʻi nalu ʻokoʻa, e hoʻomaikaʻi ana i ka maʻemaʻe kiʻi.
ʻO ka hiki ke hoʻokele wela wela
- Me ka hoʻoili wela e like me 490 W/m·K (kokoke i kēlā keleawe), hiki iā SiC ke hoʻopau koke i ka wela i hana ʻia e nā modula hōʻike Micro-LED. Mālama kēia i ka hoʻohaʻahaʻa ʻana i ka hana a i ʻole ka ʻelemakule o ka hāmeʻa ma muli o nā wela kiʻekiʻe, e hōʻoia ana i ka lōʻihi o ke ola pākaukau a me ke kūpaʻa kiʻekiʻe.
Ka ikaika a me ka lōʻihi o ka mīkini
- Loaʻa iā SiC kahi paʻakikī Mohs o 9.5 (ʻelua wale nō i ke daimana), hāʻawi i ke kūpaʻa kūʻokoʻa kūʻokoʻa, e kūpono ana ia no nā aniani mea kūʻai aku i hoʻohana pinepine ʻia. Hiki ke hoʻomalu ʻia kona ʻeleʻele i Ra <0.5 nm, e hōʻoia ana i ka haʻahaʻa haʻahaʻa a me ke ʻano like ʻole o ka lawe ʻana i nā kukui i nā alakaʻi nalu.
Hoʻolike Uila
- Hiki ke pale aku o HPSI SiC (>10⁹ Ω·cm) i ka pale ʻana i ka hōʻailona. Hiki iā ia ke lawelawe ma ke ʻano he mea hana mana kūpono, e hoʻonui ana i nā modules hoʻokele mana i nā aniani AR.
Nā kuhikuhi noi kumu mua
Nā ʻāpana Optical Core no AI/AR Glasses
- Nā Lens Waveguide Diffractive: Hoʻohana ʻia nā substrates SiC e hana i nā alakaʻi nalu optical ultra-thin e kākoʻo ana i ka FOV nui a me ka hoʻopau ʻana i ka hopena anuenue.
- Nā Papa Window a me nā Prisms: Ma o ka ʻokiʻoki ʻana a me ka polishing i hana ʻia, hiki ke hana ʻia ʻo SiC i nā puka makani pale a i ʻole nā prisms optical no nā aniani AR, e hoʻomaikaʻi ana i ka transmittance māmā a me ke kūpaʻa ʻana.
Nā noi i hoʻonui ʻia ma nā kahua ʻē aʻe
- Power Electronics: Hoʻohana ʻia i nā hiʻohiʻona kiʻekiʻe, mana kiʻekiʻe e like me nā mea hoʻohuli kaʻa ikehu hou a me nā mana kaʻa ʻoihana.
- Quantum Optics: Hana ma ke ʻano he pūʻali no nā kikowaena kala, hoʻohana ʻia i nā substrates no ka kamaʻilio quantum a me nā mea ʻike.
4 Iniha & 6 ʻīniha HPSI SiC Substrate Hoʻohālikelike Hoʻohālikelike
| ʻĀpana | Papa | 4-Inch substrate | 6-ʻīniha Lapaʻa |
| Anawaena | Papa Z / Papa D | 99.5 mm - 100.0 mm | 149.5 mm - 150.0 mm |
| ʻO ke ʻano poli | Papa Z / Papa D | 4H | 4H |
| mānoanoa | Z Papa | 500 μm ± 15 μm | 500 μm ± 15 μm |
| Papa D | 500 μm ± 25 μm | 500 μm ± 25 μm | |
| ʻO ka Wafer Orientation | Papa Z / Papa D | Ma ke axis: <0001> ± 0.5° | Ma ke axis: <0001> ± 0.5° |
| Micropipe Density | Z Papa | ≤ 1 knm² | ≤ 1 knm² |
| Papa D | ≤ 15 knm² | ≤ 15 knm² | |
| Kūʻē | Z Papa | ≥ 1E10 Ω·cm | ≥ 1E10 Ω·cm |
| Papa D | ≥ 1E5 Ω·cm | ≥ 1E5 Ω·cm | |
| ʻO ka hoʻonohonoho papa mua | Papa Z / Papa D | (10-10) ± 5.0° | (10-10) ± 5.0° |
| ʻO ka lōʻihi pālahalaha mua | Papa Z / Papa D | 32.5 mm ± 2.0 mm | Notch |
| ʻO ka lōʻihi pālahalaha lua | Papa Z / Papa D | 18.0 mm ± 2.0 mm | - |
| Hoʻokuʻu ʻia ʻo Edge | Papa Z / Papa D | 3 mm | 3 mm |
| LTV / TTV / Bow / Warp | Z Papa | ≤ 2.5 μm / ≤ 5 μm / ≤ 15 μm / ≤ 30 μm | ≤ 2.5 μm / ≤ 6 μm / ≤ 25 μm / ≤ 35 μm |
| Papa D | ≤ 10 μm / ≤ 15 μm / ≤ 25 μm / ≤ 40 μm | ≤ 5 μm / ≤ 15 μm / ≤ 40 μm / ≤ 80 μm | |
| ʻO ke koʻikoʻi | Z Papa | Polani Ra ≤ 1 nm / CMP Ra ≤ 0.2 nm | Polani Ra ≤ 1 nm / CMP Ra ≤ 0.2 nm |
| Papa D | Polani Ra ≤ 1 nm / CMP Ra ≤ 0.2 nm | Polani Ra ≤ 1 nm / CMP Ra ≤ 0.5 nm | |
| Nā māwae maka | Papa D | ʻĀpana hui ≤ 0.1% | ʻO ka lōʻihi hui ≤ 20 mm, hoʻokahi ≤ 2 mm |
| Nā ʻāpana polytype | Papa D | ʻĀpana hui ≤ 0.3% | ʻĀpana hui ≤ 3% |
| Hoʻokomo ʻia ʻo Carbon Visual | Z Papa | ʻĀpana hui ≤ 0.05% | ʻĀpana hui ≤ 0.05% |
| Papa D | ʻĀpana hui ≤ 0.3% | ʻĀpana hui ≤ 3% | |
| ʻO nā ʻili Silika | Papa D | 5 ʻae ʻia, kēlā me kēia ≤1mm | Ka lōʻihi hui ≤ 1 x anawaena |
| ʻEke Chips | Z Papa | ʻAʻole ʻae ʻia (ka laulā a me ka hohonu ≥0.2mm) | ʻAʻole ʻae ʻia (ka laulā a me ka hohonu ≥0.2mm) |
| Papa D | 7 ʻae ʻia, kēlā me kēia ≤1mm | 7 ʻae ʻia, kēlā me kēia ≤1mm | |
| ʻO ka hoʻokaʻawale ʻana o ka wiliwili | Z Papa | - | ≤ 500 knm² |
| Hoʻopili ʻana | Papa Z / Papa D | ʻO ka pahu wafer nui a i ʻole ka pahu wafer hoʻokahi | ʻO ka pahu wafer nui a i ʻole ka pahu wafer hoʻokahi |
Nā lawelawe XKH: Hoʻohui ʻia a me nā hiki ke hoʻonohonoho pono
Loaʻa i ka hui XKH nā mana hoʻohui kū pololei mai nā mea maka a hiki i nā wafers i hoʻopau ʻia, e uhi ana i ke kaulahao holoʻokoʻa o ka ulu ʻana o ka substrate SiC, ʻokiʻoki, polishing, a me ka hana maʻamau. Loaʻa nā pōmaikaʻi lawelawe nui:
- Nā mea like ʻole:Hiki iā mākou ke hāʻawi i nā ʻano wafer like ʻole e like me ke ʻano 4H-N, ʻano 4H-HPSI, ʻano 4H/6H-P, a me ke ʻano 3C-N. Hiki ke hoʻololi i ka resistivity, ka mānoanoa, a me ka orientation e like me nā koi.
- ʻHoʻopilikino nui ʻoluʻolu:Kākoʻo mākou i ka hana wafer mai ka 2-ʻīniha a hiki i ka 12-ʻīniha anawaena, a hiki ke hana i nā hale kūikawā e like me nā ʻāpana huinaha (e laʻa, 5x5mm, 10x10mm) a me nā prisms ʻole.
- ʻO ka mana pololei o ka papa Optical:Hiki ke mālama ʻia ka Wafer Total Thickness Variation (TTV) ma <1μm, a me ka roughness o ka ʻili ma Ra <0.3 nm, e hoʻokō ana i nā koi palahalaha nano-level no nā mea alakaʻi nalu.
- Pane Makeke wikiwiki:ʻO ka hoʻohālike pāʻoihana i hoʻohui ʻia e hōʻoia i ka hoʻololi maikaʻi ʻana mai ka R&D i ka hana nui, e kākoʻo ana i nā mea āpau mai ka hōʻoia liʻiliʻi a hiki i nā hoʻouna nui (ʻo ka manawa alakaʻi maʻamau 15-40 mau lā).

FAQ o HPSI SiC Wafer
Nīnau 1: No ke aha i manaʻo ʻia ai ʻo HPSI SiC he mea kūpono no nā lens waveguide AR?
A1: ʻO kāna helu kuhikuhi kiʻekiʻe (2.6–2.7) hiki iā ia ke ʻoi aku ka lahilahi a me ka ʻoi aku ka maikaʻi o nā hale alakaʻi nalu e kākoʻo ana i kahi ākea nui o ka nānā (e laʻa, 70°–80°) ʻoiai e hoʻopau ana i ka "hopena anuenue".
Q2: Pehea e hoʻomaikaʻi ai ʻo HPSI SiC i ka hoʻokele wela ma nā aniani AI/AR?
A2: Me ka thermal conductivity a hiki i 490 W / m · K (kokoke i ke keleawe), hoʻopau maikaʻi ia i ka wela mai nā mea like me Micro-LED, e hōʻoiaʻiʻo ana i ka hana paʻa a me ka lōʻihi o ke ola o ka mīkini.
Q3: He aha nā pōmaikaʻi paʻa i hāʻawi ʻia e HPSI SiC no nā aniani hiki ke hoʻohana ʻia?
A3: Hāʻawi kona ʻano paʻakikī (Mohs 9.5) i ke kūʻē ʻana i ka ʻōpala ʻoi aku ka maikaʻi no ka hoʻohana ʻana i kēlā me kēia lā i nā aniani AR.













