SiO2 Thin Film Thermal Oxide Silicon wafer 4ʻīniha 6ʻīniha 8ʻīniha 12ʻīniha

ʻO ke kaʻina hana nui o ka hana ʻana i nā wafers silicon oxidized e loaʻa i nā ʻanuʻu aʻe: ka ulu ʻana o ka silicon monocrystalline, ʻoki i loko o nā wafers, polishing, hoʻomaʻemaʻe a me ka oxidation.

ʻO ka ulu ʻana o ke silikoni monocrystalline: ʻO ka mua, ua ulu ʻia ke silikona monocrystalline i nā wela kiʻekiʻe e nā ʻano e like me ke ʻano Czochralski a i ʻole ke ʻano Float-zone.Hiki i kēia ʻano hana ke hoʻomākaukau i nā kristal hoʻokahi silika me ka maʻemaʻe kiʻekiʻe a me ka pono o ka lattice.

Dicing: ʻO ka silikoni monocrystalline ulu maʻamau i loko o ke ʻano cylindrical a pono e ʻoki ʻia i loko o nā wafers lahilahi e hoʻohana ʻia ma ke ʻano he substrate wafer.Hana ʻia ka ʻoki ʻana me ka ʻoki daimana.

Hoʻopololei: ʻAʻole like paha ka ʻili o ka wafer i ʻoki ʻia a koi ʻia ka poli kemika-mechanical no ka loaʻa ʻana o kahi ʻili maʻemaʻe.

Hoʻomaʻemaʻe: Hoʻomaʻemaʻe ʻia ka wafer i hoʻomaʻemaʻe ʻia e wehe i nā haumia a me ka lepo.

Oxidizing: ʻO ka hope, hoʻokomo ʻia nā wafers silicon i loko o kahi umu wela wela no ka hoʻomaʻamaʻa oxidizing e hana i kahi papa pale o ka silicon dioxide e hoʻomaikaʻi ai i kona mau pono uila a me ka ikaika mechanical, a me ka lawelawe ʻana ma ke ʻano he insulating layer i nā kaapuni hoʻohui.

ʻO ka hoʻohana nui ʻana o nā wafers silicon oxidized ʻo ia ka hana ʻana o nā kaʻa i hoʻohui ʻia, ka hana ʻana o nā cell solar, a me ka hana ʻana i nā mea uila ʻē aʻe.Hoʻohana nui ʻia nā wafers silikon oxide ma ke kahua o nā mea semiconductor ma muli o ko lākou ʻano mechanical maikaʻi loa, dimensional a me ka paʻa kemika, hiki ke hana i nā wela kiʻekiʻe a me nā koʻikoʻi kiʻekiʻe, a me nā mea insulating maikaʻi a me nā waiwai optical.

ʻO kāna mau mea maikaʻi, ʻo ia ka hoʻonohonoho kristal piha, ka hui kemika maʻemaʻe, nā ana kikoʻī, nā waiwai mechanical maikaʻi, a me nā mea ʻē aʻe.